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Studies on low temperature polycrystalline silicon film formation using electron cyclotron resonance silane/hydrogen plasma ECRシラン/水素プラズマを用いた多結晶シリコン低温形成に関する研究

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著者

    • 野澤, 陵一 ノザワ, リョウイチ

書誌事項

タイトル

Studies on low temperature polycrystalline silicon film formation using electron cyclotron resonance silane/hydrogen plasma

タイトル別名

ECRシラン/水素プラズマを用いた多結晶シリコン低温形成に関する研究

著者名

野澤, 陵一

著者別名

ノザワ, リョウイチ

学位授与大学

名古屋大学

取得学位

博士(工学)

学位授与番号

甲第4287号

学位授与年月日

1999-03-25

注記・抄録

博士論文

目次

  1. Contents / p1 (0003.jp2)
  2. Chapter1 Introduction / p1 (0004.jp2)
  3. 1.1 Applications of microcrystalline silicon and polycrystalline silicon films to electronic devices / p1 (0004.jp2)
  4. 1.2 Previous studies on formation techniques and formation mechanisms of microcrystalline silicon and polycrystalline silicon films / p6 (0007.jp2)
  5. 1.3 Purpose and composition of this thesis / p11 (0009.jp2)
  6. References for Chapter1 / p13 (0010.jp2)
  7. Chapter2 Experimental setup,methods of analyses of film structures and plasma diagnostics / p16 (0012.jp2)
  8. 2.1 Electron cyclotron resonance silane/hydrogen plasma system / p16 (0012.jp2)
  9. 2.2 Methods for analyzing film structure / p16 (0012.jp2)
  10. 2.3 Methods of plasma diagnostics / p20 (0014.jp2)
  11. 2.4 Methods of in-situ observation of surface reaction / p26 (0017.jp2)
  12. References for Chapter2 / p31 (0019.jp2)
  13. Chapter3 Ion bombardment effects on crystallinity of silicon films / p32 (0020.jp2)
  14. 3.1 Introduction / p32 (0020.jp2)
  15. 3.2 Experimental setup / p33 (0020.jp2)
  16. 3.3 Formation of polycrystalline silicon films on crystalline silicon substrates / p34 (0021.jp2)
  17. 3.4 Summary / p54 (0031.jp2)
  18. References for Chapter3 / p55 (0031.jp2)
  19. Chapter4 Low temperature polycrystalline silicon film formation on insulating substrates / p56 (0032.jp2)
  20. 4.1 Introduction / p56 (0032.jp2)
  21. 4.2 Experimental setup / p57 (0032.jp2)
  22. 4.3 Formation of polycrystalline silicon films on quartz substrates with and without charged species / p59 (0033.jp2)
  23. 4.4 Formation of polycrystalline silicon films on plastic substrates without charged species / p77 (0042.jp2)
  24. 4.5 Summary / p77 (0042.jp2)
  25. References for Chapter4 / p79 (0043.jp2)
  26. Chapter5 In-situ observation of hydrogenated amorphous silicon surfaces during the electron cyclotron resonance hydrogen plasma annealing for the formation of polycrystalline silicon films / p80 (0044.jp2)
  27. 5.1 Introduction / p80 (0044.jp2)
  28. 5.2 Experimental setup and preparation of the sample / p82 (0045.jp2)
  29. 5.3 In-situ observation of surface reaction during electron cyclotron resonance hydrogen plasma annealing / p84 (0046.jp2)
  30. 5.4 Summary / p93 (0050.jp2)
  31. References for Chapter5 / p95 (0051.jp2)
  32. Chapter6 Conclusions / p96 (0052.jp2)
  33. 6.1 Summary of this study / p96 (0052.jp2)
  34. 6.2 Scope for the future research / p98 (0053.jp2)
  35. Acknowledgements / p100 (0054.jp2)
  36. List of papers concerned with this thesis / p101 (0054.jp2)
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各種コード

  • NII論文ID(NAID)
    500000172990
  • NII著者ID(NRID)
    • 8000000173266
  • DOI(NDL)
  • NDL書誌ID
    • 000000337304
  • データ提供元
    • NDL-OPAC
    • NDLデジタルコレクション
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