Effects of OH on structural relaxations in silica glass シリカガラスの構造緩和に及ぼすOHの効果
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著者
書誌事項
- タイトル
-
Effects of OH on structural relaxations in silica glass
- タイトル別名
-
シリカガラスの構造緩和に及ぼすOHの効果
- 著者名
-
垣内田, 洋
- 著者別名
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カキウチダ, ヒロシ
- 学位授与大学
-
豊田工業大学
- 取得学位
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博士 (工学)
- 学位授与番号
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甲第17号
- 学位授与年月日
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2000-09-27
注記・抄録
博士論文
目次
- Contents / p3 (0004.jp2)
- Abstract / p15 (0010.jp2)
- Japanese abstract / p19 (0012.jp2)
- 1 Introduction / p1 (0014.jp2)
- 1.1 Physical properties of silica glass / p2 (0015.jp2)
- 1.2 Glass-forming process / p4 (0016.jp2)
- 1.3 Impurity effects on structural relaxation / p7 (0017.jp2)
- 1.4 Objective and composition of the present thesis / p9 (0018.jp2)
- 2 Effects of OH on structural relaxation / p31 (0029.jp2)
- 2.1 Introduction / p32 (0030.jp2)
- 2.2 Experimental procedures / p33 (0030.jp2)
- 2.3 Results / p35 (0031.jp2)
- 2.4 Discussion / p38 (0033.jp2)
- 2.5 Summary / p42 (0035.jp2)
- 3 Elementary process of structural relaxation / p57 (0042.jp2)
- 3.1 Introduction / p58 (0043.jp2)
- 3.2 Experimental procedures / p59 (0043.jp2)
- 3.3 Results / p61 (0044.jp2)
- 3.4 Discussion / p64 (0046.jp2)
- 3.5 Summary / p68 (0048.jp2)
- 4 Local structural relaxation / p81 (0054.jp2)
- 4.1 Introduction / p82 (0055.jp2)
- 4.2 OH vibrational mode and structural change around OH / p83 (0055.jp2)
- 4.3 Experimental procedures / p85 (0056.jp2)
- 4.4 Results / p88 (0058.jp2)
- 4.5 Discussion / p90 (0059.jp2)
- 4.6 Summary / p92 (0060.jp2)
- 5 Summary and conclusion / p109 (0068.jp2)
- A Measurement of the Rayleigh scattering / p115 (0071.jp2)
- A.1 Origins of light scattering / p115 (0071.jp2)
- A.2 Removal of affection by thermal radiation / p118 (0073.jp2)
- B Thickness dependence of dielectric relaxation / p121 (0074.jp2)
- C dc electrical conductivity / p124 (0076.jp2)
- C.1 Contribution of OH to dc electrical conductivity / p124 (0076.jp2)
- C.2 Contribution of other impurities to dc electrical conductivity / p125 (0076.jp2)
- List of publications / p131 (0079.jp2)