On the vacancy formation and diffusion on the Si(111) 7×7 surfaces under exposures of low oxygen pressure studied by in situ reflection electron microscopy

• SHIMIZU N.

収録刊行物

• Surface Sci

  Surface Sci 191 28-44, 1987

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• CRID: 1572824501496660992
• NII論文ID: 80003594335
• NII書誌ID: AA00853803
• データソース種別:
  • CiNii Articles