Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphology
収録刊行物
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- Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 7 (3), 2104-2109, 1989-05
American Vacuum Society
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詳細情報
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- CRID
- 1360574096338440704
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- NII論文ID
- 80004866608
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- DOI
- 10.1116/1.575980
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- ISSN
- 15208559
- 07342101
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- データソース種別
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- Crossref
- CiNii Articles