Studies of the gas-Phase Reactive Intermediates Formed by Heterogeneous Processes in Chlorosilane Chemical vapor Deposition Using Photoelectron Spectroscopy and Mass Spectroscopy

• KRUPPA G. H.

収録刊行物

• J. Phys. Chem.

  J. Phys. Chem. 94 327-331, 1990

詳細情報

• CRID: 1572543026547213568
• NII論文ID: 80005014629
• データソース種別:
  • CiNii Articles