Plasma-deposited organosilicon thin films as dry resists for deep ultraviolet lithography
収録刊行物
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- Journal of Vacuum Science and Technology
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Journal of Vacuum Science and Technology 8 1493-1496, 1990
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詳細情報
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- CRID
- 1574231876406120448
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- NII論文ID
- 80005685723
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- データソース種別
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- CiNii Articles