Electron-beam cell projection lithography: A new high-throughput electron-beam direct-writing technology using a specially tailored Si aperture

• NAKAYAMA Y.

収録刊行物

• Vac. Sci. & Technol.

  Vac. Sci. & Technol. 8 1836-1840, 1990

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• CRID: 1572261551569160960
• NII論文ID: 80005685789
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