Investigation of thermal removal of native oxide from Si(100) surface in hydrogen for low-temperature Si CVD epitaxy

• YAMAZAKI T.

収録刊行物

• J. Electrochem. Soc.

  J. Electrochem. Soc. 139 (4), 1175-1180, 1992

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• CRID: 1573668926468637696
• NII論文ID: 80006439535
• データソース種別:
  • CiNii Articles