Enhanced deposition rate of d. c. reactively sputtered TiO_2 films by means of low frequency modulation of the discharge current

• LAPOSTOLLE F.

収録刊行物

• Surface and Coatings Technology

  Surface and Coatings Technology 97 574-581, 1997

詳細情報

• CRID: 1570572701750407936
• NII論文ID: 80010317577
• データソース種別:
  • CiNii Articles