The Novel Improvement of Low Dielectric Constant Methylsilsesquioxane by N_2O Plasma Treatment

• CHANG T. C.

収録刊行物

• J. Electrochem. Soc.

  J. Electrochem. Soc. 146 3802-3806, 1999

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• CRID: 1573950401479337728
• NII論文ID: 80011387994
• データソース種別:
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