Low-temperature growth of high-integrity silicon oxide films by oxygen radical generated in high-density krypton plasma

• HIRAYAMA M.

収録刊行物

• IEDM Tech. Dig., 1999

  IEDM Tech. Dig., 1999 1999

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• CRID: 1573387451530022912
• NII論文ID: 80011719405
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