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- A. Hatzor
- Department of Chemistry, Penn State University, University Park, PA, 16802–6300, USA.
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- P. S. Weiss
- Department of Chemistry, Penn State University, University Park, PA, 16802–6300, USA.
抄録
<jats:p>A method of constructing <30-nanometer structures in close proximity with precise spacings is presented that uses the step-by-step application of organic molecules and metal ions as size-controlled resists on predetermined patterns, such as those formed by electron-beam lithography. The organic molecules serve as a ruler for scaling down a larger “parent” structure. After metal deposition and lift-off of the organic multilayer resist, an isolated smaller structure remains on the surface. This approach is used to form thin parallel wires (15 to 70 nanometers in width and 1 micrometer long) of controlled thickness and spacing. The structures obtained were imaged with field emission scanning electron microscopy. A variety of nanostructures could be scaled down, including structures with hollow patterns.</jats:p>
収録刊行物
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- Science
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Science 291 (5506), 1019-1020, 2001-02-09
American Association for the Advancement of Science (AAAS)
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キーワード
詳細情報 詳細情報について
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- CRID
- 1361981468545633280
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- NII論文ID
- 80012333123
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- ISSN
- 10959203
- 00368075
- http://id.crossref.org/issn/00368075
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- データソース種別
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- Crossref
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