Nanoparticle Synthesis by Ionizing Source Gas in Chemical Vapor Deposition.

• Adachi Motoaki

  Research Institute for Advanced Science and Technology, Osaka Prefecture University

• Tsukui Shigeki

  Research Institute for Advanced Science and Technology, Osaka Prefecture University

• Okuyama Kikuo

  Department of Chemical Engineering, Hiroshima University

抄録

A new chemical vapor deposition (CVD) method called ionization CVD, in which reactant gases are ionized, was developed for the synthesis of nanoparticles. In such a CVD method, the particles formed are charged and the repulsive Coulombic force between them suppresses their coagulation, producing non-agglomerated particles that have a relatively high number concentration and small size. A tetraethylorthosilicate (TEOS)/O₂ mixture was ionized by using a sonic-jet corona discharger. All particles formed by the ionization CVD had a negative charge and their sizes and number concentrations were 1/6–1/15 times smaller and 10–150 times higher, respectively, than those of particles formed by conventional CVD. The mean diameter of the smallest particles prepared with ionization was 8.9 nm.

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 42 (1A/B), L77-L79, 2003

  The Japan Society of Applied Physics

キーワード

• charged particles
• chemical vapor deposition
• coagulation control
• ionization
• nanoparticle
• non-agglomeration
• synthesis

詳細情報

• CRID: 1390282681233046144
• NII論文ID: 80015859103
• NII論文ID: 210000055031
• NII論文ID: 130004530296
• NII書誌ID: AA10650595
• DOI: 10.1143/jjap.42.l77
• ISSN: 13474065
• ISSN: 00214922
• NDL書誌ID: 6441034
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I6441034
• Web Site: http://stacks.iop.org/1347-4065/42/i=1A/a=L77/pdf
• 本文言語コード: en
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可