Electrochemical characteristic of chemical-mechanical polishing of copper with oxide passive film

• HEN Hanwei

収録刊行物

• Trans. Nonferrous M e. Soc. China

  Trans. Nonferrous M e. Soc. China 2003

詳細情報

• CRID: 1570572701788969472
• NII論文ID: 80016131297
• データソース種別:
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