Demonstration of Asymmetric Gate-Oxide Thickness Four-Terminal FinFETs Having Flexible Threshold Voltage and Good Subthreshold Slope
収録刊行物
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- IEEE Electron Device Letters
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IEEE Electron Device Letters 28 (3), 217-219, 2007-03
Institute of Electrical and Electronics Engineers (IEEE)
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詳細情報 詳細情報について
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- CRID
- 1360574095784115840
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- NII論文ID
- 80018630382
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- ISSN
- 07413106
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- データソース種別
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