Thin films from free atoms and particles

著者

書誌事項

Thin films from free atoms and particles

edited by Kenneth J. Klabunde

Academic Press, 1985

  • : pbk

大学図書館所蔵 件 / 全36件

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注記

Includes bibliographies and index

The book size of the paperback version is 23 cm

内容説明・目次

内容説明

Thin Films from Free Atoms and Particles is an eight-chapter text that describes the primary reaction modes of atoms or coordination-deficient particles. This book presents first an introduction to free atoms and particles, followed by a chapter describing the embryonic growth of films, such as dimers, trimers, and other small telomers formed and detected. The next chapters discuss the understanding of discharge processes for forming free atoms and particles. The remaining chapters deal with the technology, techniques, and materials in thin films. Physicists, engineers, materials scientists, and chemists will find this book of great value.

目次

Contributors Preface 1. Introduction to Free Atoms and Particles I. Free Atoms II. Free Particles III. The Elements IV. Molecular Solids V. Experimental Methods VI. Uses of Free Atoms and Particles in Chemical and Film-Formation Processes References 2. Clustering of Free Atoms and Particles: Polymerization And The Beginning Of Film Growth I. Historical Considerations II. Microclusters-The Beginning of Film Growth by the Clustering of Free Atoms III. Reactive Particles that Polymerize to Films References 3. Analysis of Glow Discharges for Understanding the Process of Film Formation I. Introduction II. Glow Discharges III. Diagnostics: Theory and Experiment IV. Review of Results V. Concluding Remarks References 4. Preparation, Structure, and Properties of Hard Coatings on the Basis of i-C and i-BN I. Introduction II. Preparation-Mechanism and Techniques III. Properties and Structure of i-C Films IV. Properties and Structure of i-BN and Composite Films V. Outlook on Applications References 5. High-Vacuum Deposition Methods Involving Superthermal Free Particles I. Introduction II. Ion-Surface Interactions III. Experimental-Principle and Description IV. Ion-Beam Sputtering Deposition V. Ion-Beam Deposition-Ionized Cluster Beam Deposition VI. Conclusion References 6. Formation of Thin Semiconducting Films by Magnetron Sputtering I. Introduction II. The Magnetron Cathode III. Effects Governing Deposition Rate of Elemental and Compound Semiconductors IV. Deposition of Compound Semiconductors V. Compound Semiconductors Deposited by Magnetron Sputtering VI. Conclusion References 7. Silicon Carbide Films I. Introduction II. Physical Properties III. Film Formation by Chemical Vapor Deposition IV. Film Formation by Physicaland Reactive Vapor Deposition V. Liquid-Phase Growth of Thin Films VI. Thin Films of Amorphous Sic 318 VII. Applications for Sic Films VIII. Summary References 8 Characterization of Thin Films by X-Ray Diffraction Armin Segmuller and Masanori Murakami I. Introduction II. X-Ray Diffraction Instrumentation for Thin-Film Studies III. Characterization of Thin Films by X-Ray Diffraction IV. Summary References Index

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