Atomic layer epitaxy

書誌事項

Atomic layer epitaxy

edited by T. Suntola and M. Simpson

Blackie , Published in the USA by Chapman and Hall, 1990

  • : U.S.
  • : U.K.

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注記

Includes index

内容説明・目次

内容説明

Atomic layer epitaxy is a method for the production of high quality, thin, solid films of specific crystal structures or orientations. It allows very fine control of film thicknesses to one atomic layer, and has attracted attention in areas such as thin film ceramics, gas sensors, radiation detectors, optical/infrared filters, anti-corrosion surface treatments, surface hardening and fibre optical materials. This book should be of interest to materials technologists, applied physicists and chemists working in the device engineering, electronics and opto-electronics industries and in academic research.

目次

Chemical aspects of the ALE process. Theoretical aspects of ALE growth mechanisms. Comparison of ALE with other techniques. ALE of III-V compounds. ALE of II-VI compounds.

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