Advances in resist technology and processing IV : 2-3 March 1987, Santa Clara, California

著者

• Bowden, M. J.
• Society of Photo-optical Instrumentation Engineers

書誌事項

Advances in resist technology and processing IV : 2-3 March 1987, Santa Clara, California

Murrae J. Bowden, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 771）

SPIE, c1987

• pbk.

注記

Includes bibliographies and index

詳細情報

• NII書誌ID(NCID): BA12853627
• ISBN:
  • 0892528060
• LCCN: 87060739
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: vi, 367 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TR940
  • DC19 : 686.2/325
• 件名:
  • LCSH : Photoresists -- Congresses
• 親書誌ID:
  • BA0022700X