Silicides : fundamentals and applications : proceedings of the 16th Course of the International School of Solid State Physics, Erice, Italy, 5-16 June 1999
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書誌事項
Silicides : fundamentals and applications : proceedings of the 16th Course of the International School of Solid State Physics, Erice, Italy, 5-16 June 1999
（The science and culture series, . Materials science）
World Scientific, c2000
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注記
"Series editor A. Zichichi"
内容説明・目次
内容説明
Silicides were introduced into the technology of electronic devices some thirty years ago; since then, they have been continuously used to form both ohmic and rectifying contacts to silicon. Silicides are also important for other applications (thermoelectric devices and structural applications, such as jet engines), but it is not easy to find an updated reference containing both their basic properties, either chemical or physical, and the latest applications.The 16th Course of the International School of Solid State Physics, held in Erice (Italy) in the late spring of 1999, was intended to break artificial barriers between disciplines, and to gather people concerned with the properties and applications of silicides, regardless of the formal fields to which they belong, or of the practical goals they pursue. This book is therefore concerned with theory as well as applications, metallurgy as well as physics, and materials science as well as microelectronics.
目次
- Crystal chemistry of metal silicides, R. Madar
- bonding and polymorphism in transition metal disilicides, L. Miglio et al
- diffusion in silicides - basic approach and practical applications, P. Gas and F.M. d'Heurle
- silicides and thermodynamics, C. Bernard and A. Pisch
- optical properties of silicides - theory and experiment, V. Antonov and F. Marabelli
- fundamental electronic properties of semiconducting silicides, V. Borisenko
- semiconducting silicides - thermoelectric properties and applications, A. Heinrich
- metallic silicides, G. Ottaviani
- the kinetics of reactive phase formation - silicides, F.M. d'Heurle
- reactive phase formation in binary and tertiary silicide systems, A.A. Kodentsov et al
- epitaxial silicides, H. Von Kanel
- ion beam synthesis, molecular beam allotaxy and self-assembled patterning of epitaxial silicides, S. Mantl
- silicides - materials science and applications for microelectronics, K. Maex and A. Lauwers
- the changing views on the Schottky Barrier, R. Tung
- metal rich structural silicides, A.J. Thom et al. (Part contents)
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