Extreme ultraviolet lithography : from the topical meeting, May 1-3, 1996, Boston, Massachusetts

著者

• Kubiak, Glenn D.
• Kania, Don R.
• Optical Society of America

書誌事項

Extreme ultraviolet lithography : from the topical meeting, May 1-3, 1996, Boston, Massachusetts

edited by Glenn D. Kubiak and Don R. Kania ; sponsored by Optical Society of America

（OSA trends in optics and photonics, v. 4）

Optical Society of America, c1996

• : pbk

注記

Includes bibliographical references (p. 222-232) and indexes

詳細情報

• NII書誌ID(NCID): BA52291180
• ISBN:
  • 1557524351
• LCCN: 95072755
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Washington, D.C.
• ページ数/冊数: ix, 235 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TS517.2
  • DC21 : 621.3815/31
• 件名:
  • LCSH : Optical coatings -- Congresses
  • LCSH : Photolithography -- Congresses
  • LCSH : Ultraviolet radiation -- Industrial applications -- Congresses
  • LCSH : Interferometry -- Congresses
  • LCSH : Lasers -- Industrial applications -- Congresses
• 親書誌ID:
  • BA29850543