Microscopy of semiconducting materials 2001 : proceedings of the Royal Microscopical Society Conference, Oxford University, 25-29 March 2001

著者

書誌事項

Microscopy of semiconducting materials 2001 : proceedings of the Royal Microscopical Society Conference, Oxford University, 25-29 March 2001

edited by A. G. Cullis and J. L. Hutchison

(Institute of Physics conference series, no. 169)

Institute of Physics Publishing, c2001

大学図書館所蔵 件 / 5

この図書・雑誌をさがす

注記

Includes bibliographical references and index

"SMM XII"

内容説明・目次

内容説明

The "Institute of Physics Conference" series is a leading International medium for the rapid publication of proceedings of major conferences and symposia reviewing new developments in physics and related areas. Volumes in the series comprise original refereed papers and are regarded as standard referee works. As such, they are an essential part of major libration collections worldwide. The twelfth conference on the Microscopy of Semiconducting Materials (MSM) was held at the University of Oxford, 25-29 March 2001. MSM conferences focus on recent international advances in semiconductor studies carried out by all forms of microscopy. The event was organized with scientific sponsorship by the Royal Microscopical Society, The Electron Microscopy and Analysis Group of the Institute of Physics and the Materials Research Society. With the continual shrinking of electronic device dimensions and accompanying enhancement in device performance, the understanding of semiconductor microscopic properties at the nanoscale (and even at the atomic scale) is increasingly critical for further progress to be achieved. This conference proceedings provides an overview of the latest instrumentation, analysis techniques and state-of-the-art advances in semiconducting materials science for solid state physicists, chemists, and materials scientists.

目次

  • High resolution microscopy and microanalysis
  • self-organized and quantum domain structures
  • epitaxy - growth phenomena
  • epitaxy - wind band-gap nitrides
  • processed silicon, substrates and dielectrics
  • metalization
  • silicides amd contacts
  • device studies and specimen preparation
  • scanning probe microscopy
  • advanced scanning electron and optical microscopy.

「Nielsen BookData」 より

関連文献: 1件中  1-1を表示

詳細情報

  • NII書誌ID(NCID)
    BA57501928
  • ISBN
    • 0750308184
  • 出版国コード
    uk
  • タイトル言語コード
    eng
  • 本文言語コード
    eng
  • 出版地
    Bristol ; Philadelphia
  • ページ数/冊数
    xiv, 610 p.
  • 大きさ
    24 cm
  • 親書誌ID
ページトップへ