Physics and technology of high-k gate dielectrics

著者

• Kar, S.
• Electrochemical Society. Meeting
• Electrochemical Society

書誌事項

Physics and technology of high-k gate dielectrics

editors, S. Kar ... [et al.] ; sponsoring divisions: Dielectric Science and Technology, Electronics and Photonics

（ECS transactions, vol. 1, no. 5, vol. 3, no. 3, vol. 11, no. 4, vol. 16, no. 5）

Electrochemical Society, c2006-

• 3
• 4
• 5
• 6

タイトル別名

Dielectric and semiconductor materials, devices, and processing

注記

v. 3: "... The Third International Symposium on High Dielectric Constant Gate Stacks, held in Los Angels, California, on October 17 -20, 2005. ..."--p. iii

v. 4: "... The Forth International Symposium on High Dielectric Constant Gate Stacks, to be held in Cancun, Mexico on October 30 to November 03, 2006. ..."--p. iii

v. 5:"... The Fifth International Symposium on High Dielectric Constant Materials and Gate Stacks, held in Washington, DC from October 8 to 10, 2007."--preface

v. 6:"... The sixth International Symposium on High Dielectric Constant Materials and Gate Stacks, held in Honolulu, Hawaii, October 13 to 15, 2008."--preface

v. 3: xi, 801 p. ; v. 4: xiv, 547 p. ; v. 5: xi, 660 p. ; v. 6: xv, 530 p.

Includes bibliographical references and indexes

詳細情報

• NII書誌ID(NCID): BA8073444X
• ISBN:
  • 1566774446
  • 1566775035
  • 9781566775700
  • 9781566776516
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Pennington, N.J.
• ページ数/冊数: v.
• 大きさ: 23 cm
• 親書誌ID:
  • BA78566502