Kamoshita Genichi

ID:9000253022257

Central Research Laboratory, Hitachi., Ltd. (1971年 CiNii収録論文より)

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  • Metallurgical Properties of Thin Aluminum Films Deposited in Vacuum

    Yamamoto Hiroshi , Kamoshita Genichi

    Thin aluminum films are widely used in the production of IC (Integrated Circuit) and LSI (Large Scale Integration), and are connected to other kinds of films or wires in these systems. Therefore, the …

    Transactions of the Japan Institute of Metals 12(1), 49-54, 1971

    DOI

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