Muranaka Seiji

ID:9000300213162

Renesas Electronics Corporation (2015年 CiNii収録論文より)

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論文一覧:  1件中 1-1 を表示

  • Study on Cone-defects during the Pattern Fabrication Process with Silicon Nitride

    Hagiwara Takuya , Saito Kentaro , Chakihara Hiraku [他] , Matsuo Shuji , Inoue Masao , Muranaka Seiji , Ota Yuki , Matsuura Masazumi

    When resist patterns are formed directly on silicon nitride (SiN), it is common for cone defects to arise after the SiN dry-etching process. When subsequent layers are deposited, the layers pile up ar …

    Journal of Photopolymer Science and Technology 28(1), 17-24, 2015

    J-STAGE

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