Arnold John C.

ID:9000300213172

IBM (2015年 CiNii収録論文より)

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  • Reduction of Critical Dimension Difference in Litho-Etch-Litho- Etch Double Patterning Process

    Tang Hao , Shearer Jeffrey C. , Cheong Lin Lee [他] , Saulnier Nicole A. , Sieg Stuart A. , Petrillo Karen , Metz Andrew , Arnold John C.

    The successful implementation of double patterning lithography in semiconductor manufacturing is dependent on the progress of several key items, including good control of critical dimension (CD) unifo …

    Journal of Photopolymer Science and Technology 28(1), 13-16, 2015

    J-STAGE

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