検索結果29件中 1-20 を表示

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  • KAMON Kazuya ID: 9000005569812

    ULSI Laboratory, Mitsubishi Electric Corp. (1995年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Effect of Lens Aberration on Resist Pattern Profiles in Edge-Line Phase-Shift Method (1995)
  • Kamon Kazuya ID: 9000252976450

    LSI Laboratory, Mitsubishi Electric Corporation (1991年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Photolithography System Using Annular Illumination (1991)
  • Kamon Kazuya ID: 9000252981085

    LSI Laboratory, Mitsubishi Electric Corporation (1992年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Photolithography System Using a Combination of Modified Illumination and Phase Shift Mask (1992)
  • Kamon Kazuya ID: 9000252985327

    LSI Laboratory, Mitsubishi Electric Corporation (1993年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Photolithography System Using Modified Illumination (1993)
  • Kamon Kazuya ID: 9000254138038

    CiNii収録論文: 1件

    • EXAFS Study on the Dehydration Process in Mg(OH)<SUB>2</SUB> (1989)
  • Kamon Kazuya ID: 9000254562604

    Department of Physics, Kwansei-Gakuin University (1986年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Temperature and Concentration Dependence of Lattice Constants in a Rondom Mixture of Ferroelectric and Antiferroelectric; Rb<SUB>1−<I>x</I></SUB>(NH<SUB>4</SUB>)<I><SUB>x</SUB></I>H<SUB>2</SUB>PO<SUB>4</SUB> (1986)
  • Kamon Kazuya ID: 9000254563144

    Department of Physics, Kwansei-Gakuin University (1987年 CiNii収録論文より)

    CiNii収録論文: 1件

    • EXAFS Study on Premartensitic Phase in Nb<SUB>3</SUB>Sn (1987)
  • Kamon Kazuya ID: 9000258120864

    ULSI Laboratory, Mitsubishi Electric Corporation, 4–1 Mizuhara, Itami 664 (1994年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Proposal of a Next-Generation Super Resolution Technique. (1994)
  • Kamon Kazuya ID: 9000258129674

    ULSI Laboratory, Mitsubishi Electric Corp., 4–1 Mizuhara, Itami, Hyogo 664, Japan (1995年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Effect of Lens Aberration on Resist Pattern Profiles in Edge-Line Phase-Shift Method. (1995)
  • Kamon Kazuya ID: 9000258134693

    Yokohama Research Center, Association of Super–Advanced Electronics Technologies, 292 Yoshida–cho, Totsuka–ku, Yokohama, Kanagawa 244, Japan (1997年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Fabrication of 0.1.MU.m Patterns Using an Alternating Phase Shift Mask in ArF Excimer Laser Lithography. (1997)
  • Kamon Kazuya ID: 9000258138642

    Yokohama Research Center, Association of Super–Advanced Electronics Technologies, 292 Yoshida–cho, Totsuka–ku, Yokohama 244–0817, Japan (1998年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Theoretical Calculations of Sensitivity of Deprotection Reactions for Acrylic Polymers for 193 nm Lithography II: Protection Groups Containing an Adamantyl Unit. (1998)
  • Kamon Kazuya ID: 9000392716558

    CiNii収録論文: 1件

    • Photolithography System Using Annular Illumination (1991)
  • Kamon Kazuya ID: 9000392720418

    CiNii収録論文: 1件

    • Photolithography System Using a Combination of Modified Illumination and Phase Shift Mask (1992)
  • Kamon Kazuya ID: 9000392724589

    CiNii収録論文: 1件

    • Photolithography System Using Modified Illumination (1993)
  • Kamon Kazuya ID: 9000401623359

    CiNii収録論文: 1件

    • Photolithography System Using Annular Illumination (1991)
  • Kamon Kazuya ID: 9000401629877

    CiNii収録論文: 1件

    • Photolithography System Using a Combination of Modified Illumination and Phase Shift Mask (1992)
  • Kamon Kazuya ID: 9000401634007

    CiNii収録論文: 1件

    • Photolithography System Using Modified Illumination (1993)
  • Kamon Kazuya ID: 9000401644756

    CiNii収録論文: 1件

    • Proposal of a Next-Generation Super Resolution Technique (1994)
  • Kamon Kazuya ID: 9000401650963

    CiNii収録論文: 1件

    • Effect of Lens Aberration on Resist Pattern Profiles in Edge-Line Phase-Shift Method (1995)
  • Kamon Kazuya ID: 9000401659704

    CiNii収録論文: 1件

    • Precision Improvement in Optical Proximity Correction by Optimizing Second Illumination Source Shape (1996)
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