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  • HIRAYAMA Masaki ID: 9000253327351

    Department of Electronic Engineering, Graduate School of Engineering, Tohoku University (2000 from CiNii)

    Articles in CiNii:1

    • Low-temperature formation of silicon oxide films by using microwave-excited Kr/O<sub>2</sub> Plasma (2000)
  • Hirayama Maaski ID: 1000070250701

    Articles in CiNii:39

    • Low-temperature formation of silicon oxide films by using microwave-excited Kr/O_2 Plasma. (2000)
    • High Performance Poly-Si TFT with Thin Gate Oxide Film Grown by Oxygen Radical(O) (2003)
    • Very High Reliability of Ultrathin Silicon Nitride Gate Dielectric Film for sub-100nm Generation (2003)
  • Hirayama Masaki ID: 9000003432352

    Dept. of Math. Sci., Osaka Pref. Univ.:JST-CREST (2006 from CiNii)

    Articles in CiNii:4

    • 12aTM-3 Vortex dynamics in nano-scale superconducting composite structures (d-dot) II (2004)
    • 28aPS-5 Interaction between neno-scale superconducting composite structures (d-dot's) (2004)
    • 19aYL-13 Interaction Between d-dot's III (2005)
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