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  • OSHIDA Makiko ID: 9000006001551

    NEC (2007 from CiNii)

    Articles in CiNii:4

    • Practical Vth Control Methods for Ni-FUSI/HfSiON MOSFETs on SOI Substrates (2007)
    • Improved Sub-10-nm CMOS Devices with Elevated Source/Drain Extensions by Tunneling Si-Selective-Epitaxial-Growth (2006)
    • Practical Vth Control Methods for Ni-FUSI/HfSiON MOSFETs on SOI Substrates (2007)
  • Oshida Makiko ID: 9000283809369

    NEC Corporation (2006 from CiNii)

    Articles in CiNii:1

    • Fully Silicided NiSi Metal Gate Electrodes on HfSiON and SiO<sub>2</sub> Gate Dielectrics (2006)
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