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  • NEZU Hiroki ID: 9000001655125

    Device Development Center, Hitachi, Ltd. (1995 from CiNii)

    Articles in CiNii:1

    • Gap-filling and planarization process using high density plasma CVD (1995)
  • NEZU Hiroki ID: 9000003736319

    日立デバイス開発センタ (2000 from CiNii)

    Articles in CiNii:4

    • 空気加圧方式研磨ヘッドにおける研磨不均一性の解析 (2000)
    • 研磨ヘッド用長寿命リテーナ材の開発 (2000)
    • Analysis of Dry Shrinkage Flow Process of Spin-Coated Film on Grooved Semiconductor Wafers (1996)
  • NEZU Hiroki ID: 9000255766868

    Articles in CiNii:1

    • Analysis of Dry Shrinkage Flow Process of Spin-Coated Film on Grooved Semiconductor Wafers. (1996)
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