Search Results1-20 of  20

  • 谷口 一雄 ID: 9000010418798

    Articles in CiNii:1

    • X線を用いた先端科学計測の現状と将来 (2006 堀場雅夫賞) (2007)
  • 谷口 一雄 ID: 9000010726169

    Articles in CiNii:1

    • Trend of X-ray key technologies, and up-to-date measurement by X-ray (2009)
  • 谷口 一雄 ID: 9000017954104

    Articles in CiNii:1

    • 農林水産業者等提案型共同研究「健康長寿食品の開発」 山ぶどうの葉を活用したポリフェノールが豊富なお茶の開発 (2009)
  • 谷口 一雄 ID: 9000241530761

    Articles in CiNii:1

    • Obituary (2013)
  • 谷口 一雄 ID: 9000241948127

    Articles in CiNii:1

    • The Measurement of the Radioactive Material in Food (2013)
  • 谷口 一雄 ID: 9000288827316

    Articles in CiNii:1

    • Superconducting Series-Junction Detectors (2015)
  • 谷口 一雄 ID: 9000356606660

    Articles in CiNii:1

    • A 1/2.3in 20Mpixel 3-Layer Stacked CMOS Image Sensor with DRAM (情報センシング) (2017)
  • 谷口 一雄 ID: 9000356652694

    Articles in CiNii:1

    • A l/2.3in 20Mpixel 3-Layer Stacked CMOS Image Sensor with DRAM (集積回路) (2017)
  • 谷口 一雄 ID: 9000389968556

    Articles in CiNii:1

    • On Site Analysis of Hokusai Paintings Using Newly Developed Portable X-Ray Powder Diffractometer (2018)
  • TANIGUCHI Kazuo ID: 1000050076832

    Articles in CiNii:41

    • International Workshop on New Oppotunities in Soft-X-Ray Emission Spectroscopy (1995)
    • 立命館大学小型放射光を利用した軟X線吸収分析関西支部研究例会の講習要旨 (1998)
    • 可搬型蛍光X線分析装置の開発 (1996)
  • TANIGUCHI Kazuo ID: 9000002337182

    大阪電気通信大学工学部電子物性工学科 (1994 from CiNii)

    Articles in CiNii:2

    • 光ドップラ-効果の実験 (1976)
    • Surface Analysis by X-ray (1994)
  • TANIGUCHI Kazuo ID: 9000004976644

    Sony Corporation Semiconductor Solutions Network Company (2005 from CiNii)

    Articles in CiNii:1

    • Burst-Cycle Data Compression Schemes for Pre-Fuse Wafer-Level Test in Large Scale High-Speed embedded DRAM (2005)
  • TANIGUCHI Kazuo ID: 9000253647753

    Osaka Electro-Communication University, Faculty of Engineering (1990 from CiNii)

    Articles in CiNii:1

    • Probing into residual forensic evidences. Application of total reflection X-ray fluorescence spectrometry.:Application of Total Reflection X-ray Fluorescence Spectrometry (1990)
  • TANIGUCHI Kazuo ID: 9000350651119

    Articles in CiNii:1

    • Total Reflection X-ray Fluorescence Spectrometry (1990)
  • Taniguchi Kazuo ID: 9000257980645

    Osaka Electro-Communication University (2003 from CiNii)

    Articles in CiNii:1

    • Microscopic Discrimination of Nacreous Nail Enamels (2003)
  • Taniguchi Kazuo ID: 9000258648266

    Institute of X-ray Technologies Co., Ltd. (2008 from CiNii)

    Articles in CiNii:1

    • 数値制御ローカルウエットエッチングによる二重湾曲分光結晶の加工:単結晶シリコン薄板の加工 (2008)
  • Taniguchi Kazuo ID: 9000283361685

    Osaka Electro-Communication University (2003 from CiNii)

    Articles in CiNii:1

    • Microscopic Discrimination of Nacreous Nail Enamels (2003)
  • Taniguchi Kazuo ID: 9000283817226

    Institute of X-ray Technologies Co. Ltd (2009 from CiNii)

    Articles in CiNii:1

    • Fabrication of Johansson-type doubly curved crystal by numerically controlled local wet etching (2009)
  • Taniguchi Kazuo ID: 9000283820128

    Techno-X Co., Ltd. (2010 from CiNii)

    Articles in CiNii:1

    • 数値制御プラズマCVMによるヨハンソン型Si(111)二重湾曲分光結晶のダメージフリー加工(第3報):形状創成加工後の表面粗さの低減 (2010)
  • Taniguchi Kazuo ID: 9000283821595

    Techno-X Co., Ltd. (2011 from CiNii)

    Articles in CiNii:1

    • Fabrication of damage-free curved silicon crystal substrate for a focusing X-ray spectrometer by Plasma Chemical Vaporization Machining (4th report):Study on generation mechanism of surface roughness (2011)
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