Search Results1-20 of  23

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  • 高橋 昌男 ID: 9000007395132

    Articles in CiNii:1

    • 新決算のタイム・スケジュ-ルと問題点 (新会計基準の適用--新決算をひかえて<特集>) (1975)
  • 高橋 昌男 ID: 9000238898802

    Articles in CiNii:1

    • シアン処理によるシリコン材料の界面制御と半導体デバイスの高性能化 (2003)
  • 高橋 昌男 ID: 9000398645454

    Articles in CiNii:1

    • 京極為兼の本懐(第3回) (2018)
  • 高橋 昌男 ID: 9000399581794

    Articles in CiNii:1

    • 京極為兼の本懐(第4回) (2019)
  • 高橋 昌男 ID: 9000402763746

    Articles in CiNii:1

    • 京極為兼の本懐(最終回) (2019)
  • TAKAHASHI Masao ID: 9000006303030

    Articles in CiNii:2

    • Transistor characteristic evaluation technology for assembly stress and assembly stress relaxation design (2008)
    • Transistor Characteristic Evaluation Technology for Assembly Stress and Assembly Stress Relaxation Design (2006)
  • TAKAHASHI Masao ID: 9000021122773

    Articles in CiNii:1

    • Resistance against oxidation of Ti1-xAlxN films prepared by RF-sputtering method. (1988)
  • TAKAHASHI Masao ID: 9000021140798

    Articles in CiNii:1

    • Electronic State of Nitride Films in the Cu3N-TiN System Prepared by a Reactive Sputtering Method. (1991)
  • TAKAHASHI Masao ID: 9000253326456

    Institute of Scientific and Industrial Research, Osaka University (1996 from CiNii)

    Articles in CiNii:1

    • He ion yield X-ray absorption fine structure at atmospheric pressure for thin film analysis (1996)
  • TAKAHASHI Masao ID: 9000255709240

    The Institute of Scientific and Industrial Research, Osaka University (1994 from CiNii)

    Articles in CiNii:1

    • Formations of Double Metal Nitrides Containing Transition Metal, (Nb1-xGax)N, ANiN and A3CoN3 (A: alkaline earth metal). (1994)
  • TAKAHASHI Masao ID: 9000384357437

    東京工科大学工学部 (2017 from CiNii)

    Articles in CiNii:1

    • 3E01 Promotion of Cooperative Education Program:To educate students with practical competence (2017)
  • Takahashi Masao ID: 1000000188054

    ISIR, Osaka Univ.:CREST-JST (2012 from CiNii)

    Articles in CiNii:50

    • He ion yield X-ray absorption fine structure at atmospheric pressure for thin film analysis (1996)
    • Reactive Co-sputter Deposition and Successive Annealing of Fe-Al-N Thin Film (1997)
    • RF-Sputter Deposition of Si-Fe-N Ternary Thin Films and Their Thermal Annealing for Granular Magnetic Films (1998)
  • Takahashi Masao ID: 9000002376904

    THE SCHOOL OF POLITICAL SCIENCE AND ECONOMICS TOKAI UNIVERSITY (2004 from CiNii)

    Articles in CiNii:11

    • Compatibility of Auditing and Management Advisory Services (1983)
    • Objectives of the Audit of Financial Statements (1986)
    • The Exact Nature and Function of Auditing (1988)
  • Takahashi Masao ID: 9000002477894

    Articles in CiNii:32

    • 『台所』坂上弘 (1997)
    • <弱者>であること--一人っ子について (安岡章太郎--羞恥のある風景<特集>) -- (安岡章太郎・主題と展開) (1977)
    • 追跡者の眼--野口さんと秋声 (追悼・野口富士男) (1994)
  • Takahashi Masao ID: 9000002478042

    Articles in CiNii:3

    • 京極為兼の本懐 (2018)
    • 京極為兼の本懐(第2回) (2018)
    • <Cogito われ思う (105)>漱石に見る近代日本 : 江藤 淳君を訪ねて (1995)
  • Takahashi Masao ID: 9000241168923

    The Institute of Scientific and Industrial research, Osaka University (2013 from CiNii)

    Articles in CiNii:1

    • 27aPS-144 Mossbauer spectroscopy and X-ray diffraction under high pressure γ'-Fe_4N (2013)
  • Takahashi Masao ID: 9000242839525

    ISIR, Osaka Univ.:CREST-JST (2002 from CiNii)

    Articles in CiNii:1

    • Chemical species in silicon oxynitride layers formed with nitrogen plasma generated by low energy (2002)
  • Takahashi Masao ID: 9000258702187

    ISIR, Osaka Univ.|CREST, JST (2007 from CiNii)

    Articles in CiNii:1

    • Removal of Cu adsorbates on bare Si surfaces by use of HCN aqueous solutions and its mechanism (2007)
  • Takahashi Masao ID: 9000258702350

    ISIR, Osaka University|CREST-JST (2007 from CiNii)

    Articles in CiNii:1

    • Oxidation of Si surfaces in azeotropic mixture of nitric acid and water at low temperature and charcteristcs of the oxide films (2007)
  • Takahashi Masao ID: 9000258704443

    ISIR, Osaka Univ.|CREST, JST (2009 from CiNii)

    Articles in CiNii:1

    • Removal of Cu contaminants on SiO2 surfaces by use of dilute HCN aqueous solutions (2009)
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