Search Results1-15 of  15

  • ABIKO Ichimatsu ID: 9000004815086

    Microsystems Technology Laboratory, Oki Electric Industry, Co., Ltd. (1997 from CiNii)

    Articles in CiNii:2

    • 1200 DPI Light Emitting Diode Array for Optical Printer Print Heads (1996)
    • 1200 Dots-Per-lnch Light Emitting Diode Array Fabricated by Solid-Phase Zinc Diffusion (1997)
  • ABIKO Ichimatsu ID: 9000006921022

    Oki Digital Imaging Corporation (2008 from CiNii)

    Articles in CiNii:1

    • CT-1-3 New LED Printhead by Epifilm Bonding Technology (2008)
  • ABIKO Ichimatsu ID: 9000283251147

    Research Laboratory, Research&Developement Group, OKI Electric Industry Co., Ltd. (1990 from CiNii)

    Articles in CiNii:1

    • A Plasma Image Bar for an Electrophotographic Printer (1990)
  • Abiko Ichimatsu ID: 9000252962230

    Research Laboratory, Oki Electric Industry Co., Ltd. (1987 from CiNii)

    Articles in CiNii:1

    • Effects of Annealing on ZnS:Tb, F Electroluminescent Thin Films Prepared by rf Magnetron Sputtering (1987)
  • Abiko Ichimatsu ID: 9000252962718

    Research Laboratory, Oki Electric Industry Co., Ltd. (1987 from CiNii)

    Articles in CiNii:1

    • ZnS:Mn Thin Film Electroluminescent Devices Having Doubly-Stacked Insulating Layers (1987)
  • Abiko Ichimatsu ID: 9000252963209

    Research Laboratory, Oki Electric Industry Co., Ltd. (1987 from CiNii)

    Articles in CiNii:1

    • Difference in Electroluminescent ZnS:Tb, F Thin Films Prepared by Electron-Beam Evaporation and RF Magnetron Sputtering (1987)
  • Abiko Ichimatsu ID: 9000252979059

    Research Laboratory OKI Electric Industry Co., Ltd. (1991 from CiNii)

    Articles in CiNii:1

    • Preparation of Plasma Chemical Vapor Deposition Silicon Nitride Films from SiH<SUB>2</SUB>F<SUB>2</SUB> and NH<SUB>3</SUB> Source Gases (1991)
  • Abiko Ichimatsu ID: 9000392705920

    Articles in CiNii:1

    • Effects of Annealing on ZnS:Tb, F Electroluminescent Thin Films Prepared by rf Magnetron Sputtering (1987)
  • Abiko Ichimatsu ID: 9000392705996

    Articles in CiNii:1

    • ZnS:Mn Thin Film Electroluminescent Devices Having Doubly-Stacked Insulating Layers (1987)
  • Abiko Ichimatsu ID: 9000392710360

    Articles in CiNii:1

    • Difference in Electroluminescent ZnS:Tb, F Thin Films Prepared by Electron-Beam Evaporation and RF Magnetron Sputtering (1987)
  • Abiko Ichimatsu ID: 9000392723752

    Articles in CiNii:1

    • Preparation of Plasma Chemical Vapor Deposition Silicon Nitride Films from SiH<SUB>2</SUB>F<SUB>2</SUB> and NH<SUB>3</SUB> Source Gases (1991)
  • Abiko Ichimatsu ID: 9000401603269

    Articles in CiNii:1

    • Difference in Electroluminescent ZnS:Tb, F Thin Films Prepared by Electron-Beam Evaporation and RF Magnetron Sputtering (1987)
  • Abiko Ichimatsu ID: 9000401605352

    Articles in CiNii:1

    • ZnS:Mn Thin Film Electroluminescent Devices Having Doubly-Stacked Insulating Layers (1987)
  • Abiko Ichimatsu ID: 9000401605381

    Articles in CiNii:1

    • Effects of Annealing on ZnS:Tb, F Electroluminescent Thin Films Prepared by rf Magnetron Sputtering (1987)
  • Abiko Ichimatsu ID: 9000401626813

    Articles in CiNii:1

    • Preparation of Plasma Chemical Vapor Deposition Silicon Nitride Films from SiH2F2and NH3Source Gases (1991)
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