Search Results1-9 of  9

  • AOKI Katsuaki ID: 9000002961645

    Articles in CiNii:5

    • High-Rate and High-Selectivity Liquid Crystal Display Process with A Large Size Surface Wave Plasma Source Using a Slot Antenna (2002)
    • 半導体・液晶プロセスに対応した高密度プラズマ源 (特集1:生産技術センターの活動成果 スピードでリードする21世紀の生産技術) (2000)
    • 半導体・液晶プロセスに対応した高密度プラズマ源 (特集 情報機器と電気加熱) (2001)
  • Aoki Katsuaki ID: 9000002759794

    Mitsubishi Heavy Industries (1980 from CiNii)

    Articles in CiNii:1

    • A GRAPHICAL APPROACH TO THE PROBLEM OF LOCATING THE ORIGIN OF THE SYSTEM FAILURE (1980)
  • Aoki Katsuaki ID: 9000401691430

    Articles in CiNii:1

    • Microwave-Excited Large-Area Plasma Source Using a Slot Antenna (2000)
  • Aoki Katsuaki ID: 9000401700536

    Articles in CiNii:1

    • Inductively Coupled Plasma Source with Internal Straight Antenna (2001)
  • Aoki Katsuaki ID: 9000401700542

    Articles in CiNii:1

    • Evaluation of Oxygen-Plasma Damage in GaAs Exposed to a Surface-Wave Plasma Source Developed for the Ashing Process (2001)
  • Aoki Katsuaki ID: 9000401707663

    Articles in CiNii:1

    • Measurement of Electron Density of Reactive Plasma Using a Plasma Oscillation Method (2002)
  • Aoki Katsuaki ID: 9000401709597

    Articles in CiNii:1

    • Oxygen Plasma Damage in GaAs Directly Exposed to Surface-Wave Plasma (2002)
  • Aoki Katsuaki ID: 9000402027802

    Articles in CiNii:1

    • Power generation characteristics of Schottky-type solar cells fabricated using barium silicide (2015)
  • Aoki Katsuaki ID: 9000402047365

    Articles in CiNii:1

    • Fabrication of solid-state secondary battery using semiconductors and evaluation of its charge/discharge characteristics (2018)
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