Search Results1-20 of  84

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  • Atoda Nobufumi ID: 9000017887459

    Articles in CiNii:1

    • Exposure characteristics of electron-sensitive polymer films (Electron and ion beam technology(特集)) (1970)
  • ATODA N. ID: 9000004430493

    Laboratory for Advanced Optical Technology, National Institute of Advanced Industrial Science and Technology (AIST) (2002 from CiNii)

    Articles in CiNii:11

    • Spectroscopic Investigation of AgO_x Films for Super Resolution Near Field Structure Application (2001)
    • Super-Resolution Readout Using a Silver Scattering Center with Plasmon Excitation Generated in a Non-Magnetic Readout Layer (2001)
    • Improvement of Super-RENS MO Disk Characteristics by Optimized Super-Resolution Near-Field Structure (2001)
  • ATODA Nobufumi ID: 9000001245613

    産業技術融合領域研究所 (2000 from CiNii)

    Articles in CiNii:2

    • Optical Memory in the 21st Century (2000)
    • 新しい近接場光利用方式「スーパーレンズ」 (特集 研究所紹介(12)産業技術融合領域研究所紹介) (1999)
  • ATODA Nobufumi ID: 9000005545653

    Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (1999 from CiNii)

    Articles in CiNii:8

    • Dual Function of Thin MoO_3 and WO_3 Films as Negative and Positive Resists for Focused Ion Beam Lithography (1996)
    • Focused Ion Beam Lithography with Transition Metal Oxide Resists : Lithography Technology : (1989)
    • Focused Ion Beam Fabrication of Fine Metal Structures by Oxide Resists : Beam-Induced Physics and Chemistry : (1991)
  • ATODA Nobufumi ID: 9000005564702

    SORTEC Corporation (1995 from CiNii)

    Articles in CiNii:1

    • Effect of Helium Gas Pressure on X-Ray Mask Heating during Synchrotron Radiation Exposure (1995)
  • ATODA Nobufumi ID: 9000005623849

    Electrotechnical Laboratory (1989 from CiNii)

    Articles in CiNii:1

    • A Method to Compensate Decay of Power in SR Lithography : Lithography Technology : (1989)
  • ATODA Nobufumi ID: 9000005733840

    SORTEC Corporation (1995 from CiNii)

    Articles in CiNii:1

    • Analysis of Deformation of X-Ray Mask Membrane in Aligner Motion (1995)
  • ATODA Nobufumi ID: 9000018265889

    Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research. (2000 from CiNii)

    Articles in CiNii:1

    • A new method of an optical near-field technique without probes and the application to high density data storage. (2000)
  • ATODA Nobufumi ID: 9000020168795

    Electrotechnical Laboratory (1983 from CiNii)

    Articles in CiNii:1

    • アブストラクト (1983)
  • ATODA Nobufumi ID: 9000107392963

    Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (NAIR) (2001 from CiNii)

    Articles in CiNii:1

    • Super-Resolution Near-Field Structure and Signal Enhancement by Surface Plasmons (2001)
  • ATODA Nobufumi ID: 9000107393348

    Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (NAIR) (2001 from CiNii)

    Articles in CiNii:1

    • Near-Field Optical Simulation of Super-Resolution Near-Field Structure Disks (2001)
  • ATODA Nobufumi ID: 9000107394218

    Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (NAIR) (2001 from CiNii)

    Articles in CiNii:1

    • The Effects of Metal-Doped GeSbTe Films on Light Scattering-Mode Super-Resolution Near-Field Structure (Super-RENS) (2001)
  • ATODA Nobufumi ID: 9000107395327

    Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (NAIR) (2001 from CiNii)

    Articles in CiNii:1

    • Magneto-Optical Characteristics Enhanced by Super Resolution Near Field Structure (2001)
  • ATODA Nobufumi ID: 9000252844990

    Electrotechnical Laboratory. (1986 from CiNii)

    Articles in CiNii:1

    • Nanometer Structure Fabrication by Electron and Ion-Beam (1986)
  • ATODA Nobufumi ID: 9000252915869

    Electrotechnical Laboratory (1986 from CiNii)

    Articles in CiNii:1

    • Synchrotron radiation lithography. (1986)
  • ATODA Nobufumi ID: 9000253032180

    Tsukuba Research Laboratory, SORTEC Corporation (1995 from CiNii)

    Articles in CiNii:1

    • X-ray lithography. Recent progress and future prospects. (1995)
  • ATODA Nobufumi ID: 9000253324449

    Electrotechnical Laboratory. (1989 from CiNii)

    Articles in CiNii:1

    • Synchrotron Radiation (SR) Lithography (1989)
  • ATODA Nobufumi ID: 9000253327333

    Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (2000 from CiNii)

    Articles in CiNii:1

    • A new method of an optical near-field technique without probes and the application to high density data storage (2000)
  • Atoda Nobufumi ID: 9000004967445

    SORTEC (1994 from CiNii)

    Articles in CiNii:1

    • Mechanism and prevention methods of resist pattern collapse (1994)
  • Atoda Nobufumi ID: 9000252758066

    Electrotechnical Laboratory (1983 from CiNii)

    Articles in CiNii:1

    • Mass- and Electron-Spectroscopic Observation of Resist Decomposition by Synchrotron Radiation (1983)
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