Search Results1-9 of  9

  • Asai Sotoju ID: 9000005304000

    Articles in CiNii:3

    • イメ-ジセンサの技術動向 (センシング技術<特集>) (1990)
    • 6)485×510画素1/2インチフォーマットカラーイメージセンサ([テレビジョン方式・回路研究会(第109回)テレビジョン電子装置研究会(第140回)]合同) (1986)
    • A 1/2" Format Color Image Sensor with 485×510 Pixels (1986)
  • Asai Sotoju ID: 9000021711178

    Articles in CiNii:1

    • Quantitative Evaluation Technique of Narrow Width Effects on DD(Deep Depletion) MOSFETs and BCCDs. (1993)
  • Asai Sotoju ID: 9000252756988

    LSI R & D Lab. Mitsubishi Electric Co. (1981 from CiNii)

    Articles in CiNii:1

    • Time Dependent Dielectric Breakdown of Thin SiO<SUB>2</SUB> Films (1981)
  • Asai Sotoju ID: 9000252946942

    Mitsubishi Electric Corporation, KitaItami Works (1980 from CiNii)

    Articles in CiNii:1

    • The Effect of Gate Bias on Hot Electron Trapping (1980)
  • Asai Sotoju ID: 9000392686280

    Articles in CiNii:1

    • Time Dependent Dielectric Breakdown of Thin SiO<SUB>2</SUB> Films (1981)
  • Asai Sotoju ID: 9000392688704

    Articles in CiNii:1

    • The Effect of Gate Bias on Hot Electron Trapping (1980)
  • Asai Sotoju ID: 9000401587311

    Articles in CiNii:1

    • The Effect of Gate Bias on Hot Electron Trapping (1980)
  • Asai Sotoju ID: 9000401589337

    Articles in CiNii:1

    • Time Dependent Dielectric Breakdown of Thin SiO2Films (1981)
  • Asai Sotoju ID: 9000402055437

    Articles in CiNii:1

    • Effect of Long Term Stress on Hot Electron Trapping (1981)
Page Top