Search Results1-5 of  5

  • CHA Han-Seob ID: 9000001620478

    R&D Center, MagnaChip Semiconductor Ltd. (2005 from CiNii)

    Articles in CiNii:9

    • Thermally Robust Nickel Silicide Process Technology for Nano-Scale CMOS Technology (2004)
    • Thermally Robust Nickel Silicide Process for Nano-Scale CMOS Technology(Si Devices and Processes, <Special Section>Fundamental and Application of Advanced Semiconductor Devices) (2005)
    • Novel Nitrogen doped Ni SALICIDE Process for Nano-Scale CMOS Technology (2004)
  • CHA Han-Seob ID: 9000107343634

    R&D Center, MagnaChip Semiconductor Inc. (2005 from CiNii)

    Articles in CiNii:1

    • Novel Nitrogen Doped Ni Self-Alingned Silicide Process for Nanoscale Complementary Metal Oxide Semiconductor Technology (2005)
  • Cha Han-Seob ID: 9000258180490

    R&D Center, MagnaChip Semiconductor Inc. (2005 from CiNii)

    Articles in CiNii:1

    • Novel Nitrogen Doped Ni Self-Alingned Silicide Process for Nanoscale Complementary Metal Oxide Semiconductor Technology (2005)
  • Cha Han-Seob ID: 9000401735479

    Articles in CiNii:1

    • Novel Nitrogen Doped Ni Self-Alingned Silicide Process for Nanoscale Complementary Metal Oxide Semiconductor Technology (2005)
  • Cha Han-Seob ID: 9000401747667

    Articles in CiNii:1

    • 2006-04-25 (2006)
Page Top