Search Results1-18 of  18

  • CHUNG Ilsub ID: 9000002173254

    School of Information and Communication Engineering, Sungkyunkwan University (2006 from CiNii)

    Articles in CiNii:1

    • FinFET NAND Flash with Nitride/Si Nanocrystal/Nitride Hybrid Trap Layer (2006)
  • CHUNG Ilsub ID: 9000004780711

    School of inforinarion and Communications Engineering, SungKyunKwan University (2002 from CiNii)

    Articles in CiNii:11

    • Hydrogen-Induced Degradation of Oxygen Plasma Treated Ferroelectric Pb(Zr,Ti)O_3 Capacitor (1999)
    • FERROELECTRIC PROPERTIES OF SOL-GEL DERIVED Pb(Zr,Ti)O_3 CAPACITORS GROWN ON IrO_2 ELECTRODE (2001)
    • Electrical properties of BLT thin films prepared by CSD (chemical Solution Deposition) method (2001)
  • CHUNG Ilsub ID: 9000005650074

    Microelectronics Laboratory, Materials and Device Sector, Samsung Advanced Institute of Technology (1999 from CiNii)

    Articles in CiNii:1

    • Effect of Oxygen Plasma Treatment on Hydrogen-Damaged Pt/Pb(Zr_xTi_<1-X>)O_3/Pt Ferroelectric Thin-Film Capacitor (1999)
  • CHUNG Ilsub ID: 9000107376087

    School of Information and Communications Engineering, SungKyunKwan University (2005 from CiNii)

    Articles in CiNii:1

    • Study on Polarization Properties of Randomly Oriented Bi_<3.35>La_<0.85>Ti_3O_<12> Ferroelectric Thin Film Utilizing Three-Dimensional Piezoresponse Image (2005)
  • CHUNG Ilsub ID: 9000107389348

    School of Information & Communications Engineering, SungKyunKwan University (2004 from CiNii)

    Articles in CiNii:1

    • Evaluation of Aluminum Oxide Thin Film in Magnetic Tunneling Junction Utilizing Scanning Probe Microscopy (2004)
  • CHUNG Ilsub ID: 9000107389564

    School of Information & Communications Engineering, SungKyunKwan University (2004 from CiNii)

    Articles in CiNii:1

    • Electrical Characterization of Sub-micron Magnetic Tunneling Junction Cells Using Scanning Probe Microscopy (2004)
  • Chung Ilsub ID: 9000058611472

    Articles in CiNii:1

    • Fin-Type Field-Effect Transistor NAND Flash with Nitride/Silicon Nanocrystal/Nitride Hybrid Trap Layer (2007)
  • Chung Ilsub ID: 9000258147339

    Microelectronics Laboratory, Materials and Device Sector, Samsung Advanced Institute of Technology, P.O. Box 111, Suwon 440–600, Korea (1999 from CiNii)

    Articles in CiNii:1

    • Effect of Oxygen Plasma Treatment on Hydrogen-Damaged Pt/Pb(ZrxT1-x)O3/Pt Ferroelectric Thin-Film Capacitor. (1999)
  • Chung Ilsub ID: 9000258159093

    School of Information and Communications Engineering, SungKyunKwan University, 300 Chunchun-dong, Jangan-gu, Suwon-city, Kyungi-do, Korea (2002 from CiNii)

    Articles in CiNii:1

    • Ferroelectric Properties of Very Thin Pb(Zr0.4Ti0.6)O3 Film Determined by Kelvin Force Microscope. (2002)
  • Chung Ilsub ID: 9000258159097

    School of Information and Communications Engineering, SungKyunKwan University, 300 Chunchun-dong, Jangan-gu, Suwon-city, Kyungi-do, Korea (2002 from CiNii)

    Articles in CiNii:1

    • Application of Scanning Probe Microscope for Novel Characterization of Ferroelectric Capacitor. (2002)
  • Chung Ilsub ID: 9000258178644

    School of Information and Communications Engineering, SungKyunKwan University (2005 from CiNii)

    Articles in CiNii:1

    • Study on Polarization Properties of Randomly Oriented Bi3.35La0.85Ti3O12 Ferroelectric Thin Film Utilizing Three-Dimensional Piezoresponse Image (2005)
  • Chung Ilsub ID: 9000401686619

    Articles in CiNii:1

    • Effect of Oxygen Plasma Treatment on Hydrogen-Damaged Pt/Pb(ZrxTi1-x)O3/Pt Ferroelectric Thin-Film Capacitor (1999)
  • Chung Ilsub ID: 9000401710532

    Articles in CiNii:1

    • Ferroelectric Properties of Very Thin Pb(Zr0.4Ti0.6)O3Film Determined by Kelvin Force Microscope (2002)
  • Chung Ilsub ID: 9000401710533

    Articles in CiNii:1

    • Application of Scanning Probe Microscope for Novel Characterization of Ferroelectric Capacitor (2002)
  • Chung Ilsub ID: 9000401742860

    Articles in CiNii:1

    • Study on Polarization Properties of Randomly Oriented Bi3.35La0.85Ti3O12Ferroelectric Thin Film Utilizing Three-Dimensional Piezoresponse Image (2005)
  • Chung Ilsub ID: 9000401776827

    Articles in CiNii:1

    • 2009-02-20 (2009)
  • Chung Ilsub ID: 9000402035014

    Articles in CiNii:1

    • Analysis of gate-induced drain leakage characteristics and threshold voltage modulation of plasma-doped FinFETs for low-power applications (2016)
  • Chung Ilsub ID: 9000402044162

    Articles in CiNii:1

    • Electrical characteristics of SiO2/ZrO2 hybrid tunnel barrier for charge trap flash memory (2017)
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