Search Results1-9 of  9

  • FUJINO Katsuhiro ID: 9000000770822

    Discovery Research Laboratories, Ono Pharmaceutical Co.,Ltd. (1997 from CiNii)

    Articles in CiNii:1

    • Effects of Steroid 5α-Reductase Inhibitor ONO-9302 and Anti-Androgen Allylestrenol on the Prostatic Growth, and Plasma and Prostatic Hormone Levels in Rats (1997)
  • FUJINO Katsuhiro ID: 9000005560478

    Semiconductor Process Laboratory (1994 from CiNii)

    Articles in CiNii:1

    • Low-Temperature Atmospheric-Pressure Chemical Vapor Deposition Using 2, 4, 6, 8-Tetramethylcyclotetrasiloxane and Ozone (1994)
  • FUJINO Katsuhiro ID: 9000020271470

    Fujitsu Limited (1987 from CiNii)

    Articles in CiNii:1

    • Stress in thin tantalum films deposited by magnetron sputtering. (1987)
  • FUJINO Katsuhiro ID: 9000248246441

    Ono Pharmaceutical Co Ltd (2013 from CiNii)

    Articles in CiNii:1

    • Urgent Management of Rapid Heart Rate in Patients With Atrial Fibrillation/Flutter and Left Ventricular Dysfunction : Comparison of the Ultra-Short-Acting β1-Selective Blocker Landiolol With Digoxin (J-Land Study) (2013)
  • Fujino Katsuhiro ID: 9000258121607

    Semiconductor Process Laboratory, 2–13–29 Kohnan, Minato–ku, Tokyo 108 (1994 from CiNii)

    Articles in CiNii:1

    • Low-Temperature Atmospheric-Pressure Chemical Vapor Deposition Using 2, 4, 6, 8-Tetramethylcyclotetrasiloxane and Ozone. (1994)
  • Fujino Katsuhiro ID: 9000283158906

    Articles in CiNii:1

    • Step Coverage Analysis for Hexamethyldisiloxane and Ozone Atmospheric Pressure Chemical Vapor Deposition. (1994)
  • Fujino Katsuhiro ID: 9000391529002

    Semiconductor Process Laboratory (1991 from CiNii)

    Articles in CiNii:1

    • Characteristics of Atmospheric Pressure CVD Films Deposited Using Organic Silicate/O<sub>3</sub> (Base Material Dependence) (1991)
  • Fujino Katsuhiro ID: 9000401640706

    Articles in CiNii:1

    • Low-Temperature Atmospheric-Pressure Chemical Vapor Deposition Using 2, 4, 6, 8-Tetramethylcyclotetrasiloxane and Ozone (1994)
  • Fujino Katsuhiro ID: 9000401646848

    Articles in CiNii:1

    • Step Coverage Analysis for Hexamethyldisiloxane and Ozone Atmospheric Pressure Chemical Vapor Deposition (1994)
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