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  • FUKAYA Kouichi ID: 9000002015398

    Semiconductor Leading Edge Technologies, Inc. (Selete) (2007 from CiNii)

    Articles in CiNii:1

    • Effect of the Hydrophilic-Lipophilic Balance (HLB) of Surfactants Included in the Post-CMP Cleaning Chemicals on Porous SiOC Direct CMP (2007)
  • Fukaya Kouichi ID: 9000006906092

    EBARA Corporation (2007 from CiNii)

    Articles in CiNii:1

    • 21721 Drying effect on hydorophobic and hydorophilic films by IPA (2007)
  • Fukaya Kouichi ID: 9000283239952

    日本電装 (株) (1994 from CiNii)

    Articles in CiNii:1

    • Development of Horizontal Low-Velocity, High Pressure Die Casting (1994)
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