Search Results1-15 of  15

  • GORWADKAR Sucheta M. ID: 9000005589496

    Electrotechnical Laboratory (1998 from CiNii)

    Articles in CiNii:3

    • Fabrication of Nanometer-Scale Vertical MIM Tunnel Junctions Using a Double-Layered Inorganic Resist (1997)
    • Fabrication of Nanometer-Scale Vertical Metal-Insulator-Metal Tunnel Junctions Using a Silicon-on-Insulator Substrate (1998)
    • SiO_2/c-Si Bilayer Electron-Beam Resist Process for Nano-Fabrication (1996)
  • GORWADKAR Sucheta ID: 9000005562400

    Center for Cooperative Research in Advanced Science and Technology, Nagoya University (1994 from CiNii)

    Articles in CiNii:1

    • Patterning of 2 -10 Nanometer-Scale Plasma-Polymerized Organic Films by Atomic Force Microscope (1994)
  • GORWADKAR Sucheta ID: 9000006051355

    産業技術総合研究所光技術研究部門 (2005 from CiNii)

    Articles in CiNii:1

    • Fabrication of deformable mirror with polymide substrate (2005)
  • GORWADKAR Sucheta ID: 9000006643961

    AIST Tsukuba Central (2008 from CiNii)

    Articles in CiNii:1

    • Technical issues of etching process for Nb-junction circuit technology : Reactive ion etching (RIE) of Nb films (2008)
  • GORWADKAR Sucheta ID: 9000015563705

    National Institute of Advanced Industrial Science and Technology (2003 from CiNii)

    Articles in CiNii:1

    • Ultrafast Active Transmission Lines with Low-k Polyimide Integrated with Ultrafast Photoconductive Switches (2003)
  • Gorwadkar Sucheta M. ID: 9000258141151

    Electrotechnical Laboratory, 1–1–4 Umezono, Tsukuba–shi, Ibaraki 305, Japan (1998 from CiNii)

    Articles in CiNii:1

    • Fabrication of Nanometer-Scale Vertical Metal-Insulator-Metal Tunnel Junctions Using a Silicon-on-Insulator Substrate. (1998)
  • Gorwadkar Sucheta M. ID: 9000401659974

    Articles in CiNii:1

    • SiO2/c-SiBilayer Electron-Beam Resist Process for Nano-Fabrication (1996)
  • Gorwadkar Sucheta M. ID: 9000401671095

    Articles in CiNii:1

    • Fabrication of Nanometer-Scale Vertical Metal-Insulator-Metal Tunnel Junctions Using a Silicon-on-Insulator Substrate (1998)
  • Gorwadkar Sucheta ID: 9000258119899

    Center for Cooperative Research in Advanced Science and Technology, Nagoya University, Nagoya 464–01 (1994 from CiNii)

    Articles in CiNii:1

    • Patterning of 2-10 Nanometer-Scale Plasma-Polymerized Organic Films by Atomic Force Microscope (1994)
  • Gorwadkar Sucheta ID: 9000258165271

    National Institute of Advanced Industrial Science and Technology (2003 from CiNii)

    Articles in CiNii:1

    • Ultrafast Active Transmission Lines with Low-k Polyimide Integrated with Ultrafast Photoconductive Switches. (2003)
  • Gorwadkar Sucheta ID: 9000401644399

    Articles in CiNii:1

    • 1994-11-15 (1994)
  • Gorwadkar Sucheta ID: 9000401722325

    Articles in CiNii:1

    • Ultrafast Active Transmission Lines with Low-kPolyimide Integrated with Ultrafast Photoconductive Switches (2003)
  • Sucheta Gorwadkar ID: 9000252982146

    Department of Electronic-Science, University of Poona (1992 from CiNii)

    Articles in CiNii:1

    • Improvement in the Sensitivity of PPMMA Electron Beam Resist by S and F Atom Doping (1992)
  • Sucheta Gorwadkar ID: 9000392715043

    Articles in CiNii:1

    • Improvement in the Sensitivity of PPMMA Electron Beam Resist by S and F Atom Doping (1992)
  • Sucheta Gorwadkar ID: 9000401628607

    Articles in CiNii:1

    • Improvement in the Sensitivity of PPMMA Electron Beam Resist by S and F Atom Doping (1992)
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