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  • HAKOZAKI Tomohiro ID: 9000000228118

    Department of Chemical Engineering, Faculty of Engineering, Kyoto University (1997 from CiNii)

    Articles in CiNii:1

    • Numerical Simulation of Plasma Chemical Vapor Deposition from Silane:Effects of the Plasma-Substrate Distance and Hydrogen Dilution (1997)
  • HAKOZAKI Tomohiro ID: 9000001949395

    Kobe Technical Center, Procter & Gamble Far East (2006 from CiNii)

    Articles in CiNii:1

    • Novel screening method for ultraviolet protection : Combination of a human skin-equivalent model and 8-hydroxy-2'-deoxyguanosine (2006)
  • HAKOZAKI Tomohiro ID: 9000002089305

    Kobe Technical Center, Procter & Gamble Northeast Asia Pte. Ltd. (2006 from CiNii)

    Articles in CiNii:1

    • Inhibition of inflammatory nitric oxide production and epidermis damages by Saccharomycopsis Ferment Filtrate (2006)
  • Hakozaki Tomohiro ID: 9000401664330

    Articles in CiNii:1

    • Numerical Simulation of Plasma Chemical Vapor Deposition from Silane: Effects of the Plasma-Substrate Distance and Hydrogen Dilution (1997)
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