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  • HAMA Kaoru ID: 9000005565945

    Toshiba Microelectronics Corp. (1995 from CiNii)

    Articles in CiNii:1

    • Relation between Stress-Induced Leakage Current and Dielectric Breakdown in SiN-Based Antifuses (1995)
  • HAMA Kaoru ID: 9000255913296

    <I>Faculty of Pharmaceutical Sciences, Nagasaki University</I> (1985 from CiNii)

    Articles in CiNii:1

    • Seasonal variations of tropane alkaloids content in Duboisia. Comparison among individual plants.:—Comparison among Individual Plants— (1985)
  • HAMA Kaoru ID: 9000256722470

    <I>Faculty of Pharmaceutical Science, Nagasaki University</I> (1985 from CiNii)

    Articles in CiNii:1

    • The relation between the position of branches and the tropane alkaloid content in Duboisia myoporoides R. Br. (1985)
  • Hama Kaoru ID: 9000258126274

    Toshiba Microelectronics Corp., 1 Komukai–Toshiba–cho, Saiwai–ku, Kawasaki, Kanagawa 210, Japan (1995 from CiNii)

    Articles in CiNii:1

    • Relation between Stress-Induced Leakage Current and Dielectric Breakdown in SiN-Based Antifuses. (1995)
  • Hama Kaoru ID: 9000401648049

    Articles in CiNii:1

    • Relation between Stress-Induced Leakage Current and Dielectric Breakdown in SiN-Based Antifuses (1995)
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