Search Results1-12 of  12

  • HASAKA Satoshi ID: 9000001495818

    TAIYO NIPPON SANSO CORPRATION (2005 from CiNii)

    Articles in CiNii:1

    • Physical and Electrical Properties of Ultra Thin Yttrium-Aluminate Film (2005)
  • HASAKA Satoshi ID: 9000002170069

    TAIYO NIPPON SANSO CORPORATION (2005 from CiNii)

    Articles in CiNii:1

    • Thermal Stability of the Yttrium Aluminate Film and the Suppression of its structural change and electrical properties degradation (2005)
  • HASAKA Satoshi ID: 9000002170215

    Taiyo Nippon Sanso Corporation (2006 from CiNii)

    Articles in CiNii:2

    • Hydrocarbon Groups and Film Properties of SiOCH Dielectrics : Theoretical Investigations using Molecular Models (2005)
    • SiOCH Films with Hydrocarbon Network Bonds : First-Principles Investigation (2006)
  • HASAKA Satoshi ID: 9000107354662

    Tsukuba Laboratory, Taiyo Nippon Sanso Corporation (2006 from CiNii)

    Articles in CiNii:1

    • Etching of High-k Dielectric HfO_2 Films in BCl_3-Containing Plasmas Enhanced with O_2 Addition (2006)
  • HASAKA Satoshi ID: 9000257982960

    TAIYO NIPPON SANSO CORPRATION (2005 from CiNii)

    Articles in CiNii:1

    • Physical and Electrical Properties of Ultra Thin Yttrium-Aluminate Film (2005)
  • Hasaka Satoshi ID: 9000025080617

    Articles in CiNii:1

    • Effectiveness of dimethyl carbonate and dipivaloyl methane chemicals for internal repair of plasma-damaged low-k films (Special issue: Advanced metallization for ULSI applications) (2011)
  • Hasaka Satoshi ID: 9000054560146

    Articles in CiNii:1

    • Carbon-Doped Silicon Oxide Films with Hydrocarbon Network Bonds for Low-kDielectrics: Theoretical Investigations (2007)
  • Hasaka Satoshi ID: 9000401755458

    Articles in CiNii:1

    • Etching of High-kDielectric HfO2Films in BCl3-Containing Plasmas Enhanced with O2Addition (2006)
  • Hasaka Satoshi ID: 9000401788304

    Articles in CiNii:1

    • High-Etching-Selectivity Barrier SiC (k<3.5) Film for 32-nm-Node Copper/Low-kInterconnects (2010)
  • Hasaka Satoshi ID: 9000401788319

    Articles in CiNii:1

    • 2010-05-20 (2010)
  • Hasaka Satoshi ID: 9000401788326

    Articles in CiNii:1

    • Proposal of New Precursors for Plasma-Enhanced Chemical Vapor Deposition of SiOCH Low-kFilms with Plasma Damage Resistance (2010)
  • Hasaka Satoshi ID: 9000401997956

    Articles in CiNii:1

    • Effectiveness of Dimethyl Carbonate and Dipivaloyl Methane Chemicals for Internal Repair of Plasma-Damaged Low-kFilms (2011)
Page Top