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  • HAYASE RUMIKO HORIGUCHI ID: 9000253031188

    Chemical Lab. R&D Center, Toshiba Co. (1992 from CiNii)

    Articles in CiNii:1

    • Acid catalyzed resist for KrF excimer laser lithography. (2). Polymer dissolution inhibitors. (1992)
  • HORIGUCHI HAYASE RUMIKO ID: 9000253031106

    Chemical Laboratory, Toshiba R&D Center (1991 from CiNii)

    Articles in CiNii:1

    • Acid catalyzed resist for KrF excimer laser lithography. (1991)
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