Search Results1-20 of  29

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  • HIKOSAKA Yukinobu ID: 9000004963776

    Articles in CiNii:3

    • Embedded FRAM on CMOS logic LSI technology (2002)
    • A Triple-Protection Structured COB FRAM with 1.2-V Operation and 10¹⁷-Cycle Endurance (集積回路) (2016)
    • Fully Compatible Ferroelectric Capacitor Process to 0.18μm Logic Process for 4M bit Embedded FRAM (2003)
  • HIKOSAKA Yukinobu ID: 9000005543954

    Association of Super-Advanced Electronics Technologies (ASET):(Present address)Device Development Div. Fujitsu Ltd. (1999 from CiNii)

    Articles in CiNii:3

    • Reduction of Electron Shading Damage Using Synchronous Bias in Pulsed Plasma (1996)
    • Plasma-Wall Interactions In Dual Freguency Narrow-Gap Reactive Ion Etching System (1998)
    • Realistic Etch Yield of Fluorocarbon Ions in SiO_2 Etch Process (1999)
  • HIKOSAKA Yukinobu ID: 9000014258525

    ASET (1998 from CiNii)

    Articles in CiNii:1

    • Measurement of Electron Energy Distribution Function by RF-Biased Optical Probe Method (1998)
  • HIKOSAKA Yukinobu ID: 9000107345985

    Plasma Technology Laboratory, Association of Super-advanced Electronics Technologies(ASET) (1998 from CiNii)

    Articles in CiNii:1

    • Mechanism of Radical Control in Capacitive RF Plasma for ULSI Processing (1998)
  • HIKOSAKA Yukinobu ID: 9000107346103

    Plasma Technology Laboratory, Association of Super-Advanced Electronics Technologies(ASET) (1998 from CiNii)

    Articles in CiNii:1

    • Monitoring of Electron Energy Distribution Change from Optical Emission for Nonmagnetic Ultrahigh-Frequency Plasma (1998)
  • HIKOSAKA Yukinobu ID: 9000253328197

    FRAM Division, Fujitsu Ltd. (2002 from CiNii)

    Articles in CiNii:1

    • Embedded FRAM on CMOS logic LSI technology (2002)
  • HIKOSAKA Yukinobu ID: 9000309572840

    Aizu Factory, Fujitsu Semiconductor Limited (2015 from CiNii)

    Articles in CiNii:1

    • An 8-Mbit 0.18-µm CMOS 1T1C FeRAM in Planar Technology (2015)
  • Hikosaka Yukinobu ID: 9000252987058

    Department of Electrical Engineering, Nagoya University (1993 from CiNii)

    Articles in CiNii:1

    • Radical Kinetics in a Fluorocarbon Etching Plasma (1993)
  • Hikosaka Yukinobu ID: 9000252988758

    Department of Electrical Engineering, Nagoya University (1993 from CiNii)

    Articles in CiNii:1

    • Spatial Distribution and Surface Loss of CF<SUB>3</SUB> and CF<SUB>2</SUB> Radicals in a CF<SUB>4</SUB> Etching Plasma (1993)
  • Hikosaka Yukinobu ID: 9000252989141

    Department of Electrical Engineering, Nagoya University (1993 from CiNii)

    Articles in CiNii:1

    • Drastic Change in CF<SUB>2</SUB> and CF<SUB>3</SUB> Kinetics Induced by Hydrogen Addition into CF<SUB>4</SUB> Etching Plasma (1993)
  • Hikosaka Yukinobu ID: 9000258121671

    Department of Electrical Engineering, Nagoya University, Furo–cho, Chikusa–ku, Nagoya 464–01|Basic Process Development Division, FUJITSU LTD., Kami–kodanaka, Nakahara–ku, Kawasaki 211 (1994 from CiNii)

    Articles in CiNii:1

    • Free Radicals in an Inductively Coupled Etching Plasma. (1994)
  • Hikosaka Yukinobu ID: 9000258141300

    Plasma Technology Laboratory, Association of Super–Advanced Electronics Technologies (ASET), 292 Yoshida–cho, Totsuka, Yokohama, Kanagawa 244–0817, Japan (1998 from CiNii)

    Articles in CiNii:1

    • Monitoring of Electron Energy Distribution Change from Optical Emission for Nonmagnetic Ultrahigh-Frequency Plasma. (1998)
  • Hikosaka Yukinobu ID: 9000258141560

    Plasma Technology Laboratory, Association of Super–advanced Electronics Technologies (ASET), 292 Yoshida–cho, Totsuka–ku, Yokohama, Kanagawa 244, Japan (1998 from CiNii)

    Articles in CiNii:1

    • Mechanism of Radical Control in Capacitive RF Plasma for ULSI Processing. (1998)
  • Hikosaka Yukinobu ID: 9000392733607

    Articles in CiNii:1

    • Spatial Distribution and Surface Loss of CF<SUB>3</SUB> and CF<SUB>2</SUB> Radicals in a CF<SUB>4</SUB> Etching Plasma (1993)
  • Hikosaka Yukinobu ID: 9000392734533

    Articles in CiNii:1

    • Drastic Change in CF<SUB>2</SUB> and CF<SUB>3</SUB> Kinetics Induced by Hydrogen Addition into CF<SUB>4</SUB> Etching Plasma (1993)
  • Hikosaka Yukinobu ID: 9000392735345

    Articles in CiNii:1

    • Radical Kinetics in a Fluorocarbon Etching Plasma (1993)
  • Hikosaka Yukinobu ID: 9000401634548

    Articles in CiNii:1

    • Radical Kinetics in a Fluorocarbon Etching Plasma (1993)
  • Hikosaka Yukinobu ID: 9000401639017

    Articles in CiNii:1

    • Spatial Distribution and Surface Loss of CF3and CF2Radicals in a CF4Etching Plasma (1993)
  • Hikosaka Yukinobu ID: 9000401639480

    Articles in CiNii:1

    • Drastic Change in CF2and CF3Kinetics Induced by Hydrogen Addition into CF4Etching Plasma (1993)
  • Hikosaka Yukinobu ID: 9000401640813

    Articles in CiNii:1

    • Free Radicals in an Inductively Coupled Etching Plasma (1994)
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