Search Results1-20 of  1913

  • Hiroshima Takuya ID: 9000404643586

    University of Tokyo Hokkaido Forest, The University of Tokyo Forests, Graduate School of Agricultural and Life Sciences, The University of Tokyo, Higashimachi 9-6-1, Yamabe, Furano, Hokkaido 079-1563, Japan (2019 from CiNii)

    Articles in CiNii:1

    • Comparative Study on Commercial Log Production Managed under Different Conditions: Evaluating Plantation Grown Teak of Sri Lanka (2019)
  • Hiroshima Kenzo ID: 9000009551337

    Articles in CiNii:1

    • Characterization of Asbestos Bodies and Uncoated Fibers in Lungs of Hamsters (1993)
  • Hiroshima Hiroshi ID: 9000010004163

    Articles in CiNii:3

    • Fidelity of Photo-nanoimprint (2005)
    • A dynamic system to evaluate the UV shrinkage characteristics of UV photopolymers used for nanoimprint (2010)
    • Viscosity of a thin film of UV curable resin in pentafluoropropane (2010)
  • Hiroshima Hiroshi ID: 9000010734492

    Articles in CiNii:1

    • Evaluation of viscosity characteristics of UV nanoimprint resin in a thin film (2009)
  • Hiroshima Hiroshi ID: 9000016967889

    Articles in CiNii:1

    • Viscosity measurement of spin-coated UV nanoimprint resin (2010)
  • Hiroshima Fumio ID: 9000017734602

    Articles in CiNii:1

    • Self-adjoint extensions of momentum operators: application of weak Weyl relations (2010)
  • Sakai Hiroshima ID: 9000018457599

    Articles in CiNii:1

    • Non-magnetic to magnetic transition under high pressure in narrow-gap semiconductor β-US2 (Proceedings of the International Conference on Heavy Electrons 2010 (ICHE2010)) (2011)
  • Hiroshima Hiroshi ID: 9000018623372

    Articles in CiNii:1

    • High temporal resolution measurements of shrinkage characteristics of UV nanoimprint resin (2011)
  • Hiroshima Hiroshi ID: 9000018976518

    Articles in CiNii:1

    • Simulation of Resist Filling Properties under Condensable Gas Ambient in Ultraviolet Nanoimprint Lithography (Special Issue : Microprocesses and Nanotechnology) (2012)
  • Hiroshima Hiroshi ID: 9000018976533

    Articles in CiNii:1

    • Throughput of Ultraviolet Nanoimprint in Pentafluoropropane Using Spin Coat Films under Thin Residual Layer Conditions (Special Issue : Microprocesses and Nanotechnology) (2012)
  • Hiroshima Fumio ID: 9000019178356

    Articles in CiNii:1

    • Note on the spectrum of discrete Schrodinger operators (2012)
  • Hiroshima Yasushi ID: 9000024936997

    Articles in CiNii:1

    • Effects of Capping Layer on Grain Growth with μ-Czochralski Process during Excimer Laser Crystallization (2006)
  • Hiroshima Hiroshi ID: 9000025041747

    Articles in CiNii:1

    • Effects of granularity of complementary patterns in a capacity-equalized mold used for UV nanoimprint lithography (Special issue: Microprocesses and nanotechnology) (2011)
  • Hiroshima Hiroshi ID: 9000025041869

    Articles in CiNii:1

    • Effect of dropping hydrofluoroether in thermal nanoimprint on polycarbonate (Special issue: Microprocesses and nanotechnology) (2011)
  • Hiroshima Hiroshi ID: 9000025041960

    Articles in CiNii:1

    • Study on change in UV nanoimprint pattern by altering shrinkage of UV curable resin (Special issue: Microprocesses and nanotechnology) (2011)
  • Hiroshima Hiroshi ID: 9000025042050

    Articles in CiNii:1

    • Fluorescent microscopy proving resin adhesion to a fluorinated mold surface suppressed by pentafluoropropane in step-and-repeat ultraviolet nanoimprinting (Special issue: Microprocesses and nanotechnology) (2011)
  • Hiroshima Hiroshi ID: 9000025059328

    Articles in CiNii:1

    • Homogeneity of residual layer thickness in UV nanoimprint lithography (Special issue: Microprocesses and nanotechnology) (2009)
  • Hiroshima Hiroshi ID: 9000025083044

    Articles in CiNii:1

    • Evaluation of viscosity characteristics of spin-coated UV nanoimprint resin (Special issue: Microprocesses and nanotechnology) (2010)
  • Hiroshima Hiroshi ID: 9000025083124

    Articles in CiNii:1

    • Effects of environmental gas in UV nanoimprint on the characteristics of UV-curable resin (Special issue: Microprocesses and nanotechnology) (2010)
  • Hiroshima Hiroshi ID: 9000025083998

    Articles in CiNii:1

    • Evaluation of UV-nanoimprinted surface roughness using Si mold with atomically flat terraces (2007)
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