Search Results1-20 of  256

  • Hori Masaru ID: 9000018879631

    Articles in CiNii:1

    • Floating Wire for Enhancing Ignition of Atmospheric Pressure Inductively Coupled Microplasma (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials) (2012)
  • Hori Masaru ID: 9000025017640

    Articles in CiNii:1

    • Contrast enhancement of wavelength-selective detection of mid-infrared using localized atmospheric-pressure plasma treatment (Special issue: Solid state devices and materials) (2010)
  • HORI Masaru ID: 9000005623784

    ULSI Research Center, Toshiba Corporation (1989 from CiNii)

    Articles in CiNii:1

    • Fabrication of an ultra Low Stress Tungsten Absorber for X-Ray Masks : Lithography Technology : (1989)
  • HORI Masaru ID: 9000018264904

    Nagoya University (2003 from CiNii)

    Articles in CiNii:2

    • 第7回 「科学と生活のフェスティバル」 報告 (2001)
    • Overview of Science Fair "Plasma World" (2003)
  • HORI Masaru ID: 9000020204882

    Department of Electronic-Mechanical Engineering, Nagoya University (1986 from CiNii)

    Articles in CiNii:1

    • Total dry electron-beam vacuum lithography system using 4 rotary chambers. (1986)
  • HORI Masaru ID: 9000020934090

    Department of Electrical Engineering and Computer Science, Nagoya University (2012 from CiNii)

    Articles in CiNii:1

    • Dry De-smear of Via Bottom Residue Using 60 Hz Nonequilibrium Atmospheric Pressure Plasma with Trifluoromethyle Trifluorovinyl Ether Mixing Gas (2012)
  • HORI Masaru ID: 9000021755200

    Nature Conservation Committee of Wakayama Prefecture (1979 from CiNii)

    Articles in CiNii:1

    • A Study of the Boundary Area of Profitable Cultivation of Satsuma Mandarin (<i>Citrus unshiu</i> Marc.) in the Valley of Kino River from the View Point of Natural Vegetation (1979)
  • HORI Masaru ID: 9000253327124

    Department of Quantum Engineering, Graduate School of Engineering, Nagoya University (1999 from CiNii)

    Articles in CiNii:1

    • High-density plasma and its application to etching and thin-film formation (1999)
  • HORI Masaru ID: 9000255708068

    Japan Storage Battery Co., Ltd. (1988 from CiNii)

    Articles in CiNii:1

    • Porosity and pore-size distribution of sintered nickel plaque for battery by slurry technique. (1988)
  • HORI Masaru ID: 9000256043142

    Department of Electronics, Nagoya University (1984 from CiNii)

    Articles in CiNii:1

    • Molecular Structure of Plasma-polymerized Methyl Methacrylate and Evaluation as a Resist (1984)
  • HORI Masaru ID: 9000256640230

    Articles in CiNii:1

    • DOUBLE TRACT RECONSTRUCTION METHOD (1976)
  • HORI Masaru ID: 9000318134259

    Articles in CiNii:3

    • Cancer therapy by low-temperature atmospheric pressure plasma (2016)
    • 4. Effects of Plasma-Activated Medium on Cells(<Special Topic Article>Plasma Induced Biological Reactions and Their Applications for Biology and Medicine) (2015)
    • Plasma-Activated Solution : Mechanism of Action, Clinical Application, and Industrialization (2015)
  • HORI Masaru ID: 9000363150887

    Articles in CiNii:1

    • VIII-4 Synthesis of carbon nanowalls and their applications (2006)
  • HORI Masaru ID: 9000397866253

    名古屋大学未来社会創造機構 (2015 from CiNii)

    Articles in CiNii:1

    • プラズマ医療の可能性と今後の展望 (2015)
  • HORI Masaru ID: 9000404501875

    Articles in CiNii:1

    • Phase Transition of Nickel (Cobalt) Hydroxide Electrode during Charging Process (1989)
  • Hori Masaru ID: 1000080242824

    Nagoya University (2015 from CiNii)

    Articles in CiNii:29

    • Cotrol of SiO_2/Si Selective Etching Process by Novel Radical Injection Technique Using Laser Ablation (1999)
    • Chamber cleaning process keeping harmony with environment by using laser ablation (1999)
    • Spatial distribution measurement of absolute CFx radical densities and the formation mechanism of their spatial distribution in ECR C_4F_8 plasma (1999)
  • Hori Masaru ID: 9000024687003

    Articles in CiNii:1

    • Surface reaction of CF_2 radicals for fluorocarbon film formation in SiO_2/Si selective etching process (1998)
  • Hori Masaru ID: 9000024697685

    Articles in CiNii:1

    • Plasma diagnostics and low-temperature deposition of microcrystalline silicon films in ultrahigh-frequency silane (2000)
  • Hori Masaru ID: 9000024702692

    Articles in CiNii:1

    • Absolute density measurement of cyanogen fluoride in CHF_3/N_2 electron cyclotron resonance plasma using infrared diode laser absorption spectroscopy (1997)
  • Hori Masaru ID: 9000024708938

    Articles in CiNii:1

    • Formation and micromachining of Teflon (fluorocarbon polymer) film by a completely dry process using synchrotron radiation (1999)
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