Search Results1-2 of  2

  • ISHIMARU Tomomi ID: 9000005916626

    Canon Sales Co., Inc. (2004 from CiNii)

    Articles in CiNii:2

    • Properties of Low-k Cu Barrier SiOCNH Film Deposited by Plasma-Enhanced Chemical Vapor Deposition using Hexamethyldisiloxane and Ammonia Gases (2004)
    • Pore Characteristics of Low-Dielectric-Constant Films Grown by Plasma-Enhanced Chemical Vapor Deposition Studied by Positron Annihilation Lifetime Spectroscopy (2001)
  • Ishimaru Tomomi ID: 9000401703550

    Articles in CiNii:1

    • Pore Characteristics of Low-Dielectric-Constant Films Grown by Plasma-Enhanced Chemical Vapor Deposition Studied by Positron Annihilation Lifetime Spectroscopy (2001)
Page Top