Search Results81-100 of  108

  • Itoh Hitoshi ID: 9000017446681

    Department of Physics, Kumamoto University (2010 from CiNii)

    Articles in CiNii:1

    • On the Warped Disk in NGC 4258 (2010)
  • Itoh Hitoshi ID: 9000245827654

    広島大学大学院 (1990 from CiNii)

    Articles in CiNii:1

    • On Specifying Cultural Content for Language Classes (1990)
  • Itoh Hitoshi ID: 9000252958123

    Toshiba Research and Development Center (1986 from CiNii)

    Articles in CiNii:1

    • Tungsten Photochemical Vapor Deposition Mechanism in WF<SUB>6</SUB>+H<SUB>2</SUB> System II. Gas-Molecule Adspecies Collision Model (1986)
  • Itoh Hitoshi ID: 9000252958129

    Toshiba Research and Development Center (1986 from CiNii)

    Articles in CiNii:1

    • Tungsten Photochemical Vapor Deposition Mechanism in WF<SUB>6</SUB>+H<SUB>2</SUB> System I. Adspecies Excitation Model (1986)
  • Itoh Hitoshi ID: 9000252977280

    ULSI Research Center, Toshiba Corp. (1991 from CiNii)

    Articles in CiNii:1

    • Mechanism for Initial Stage of Selective Tungsten Growth Employing a WF<SUB>6</SUB> and SiH<SUB>4</SUB> Mixture (1991)
  • Itoh Hitoshi ID: 9000253396055

    Department of Neuro-psychiatry, Keio University School of Medicine (1960 from CiNii)

    Articles in CiNii:1

    • Pre-staining Procedure for Electrophoretic Study of Serum-Lipoprotein with acetylated Sudan black B (1960)
  • Itoh Hitoshi ID: 9000254096387

    Division of Hemodialysis, Kyoto University Hospital (1995 from CiNii)

    Articles in CiNii:1

    • The effect of elcatonin on renal osteodystrophy in long-term hemodialysis patients. Part 2: Assessment by bone scintigraphy and dual energy X-ray absorptiometry(DEXA).:Assessment by bone scintigraphy and dual energy X-ray absorptiometry (DEXA) (1995)
  • Itoh Hitoshi ID: 9000254441409

    Kanagawa Red Cross Blood Center (1992 from CiNii)

    Articles in CiNii:1

    • Effect of leukocyte romoval filter on platelet function and prevention of post-transfusion side reactions. (1992)
  • Itoh Hitoshi ID: 9000255900055

    ULSI Research Center, Toshiba Corporation (1989 from CiNii)

    Articles in CiNii:1

    • Tungsten selective CVD and its applications to VLSI metallization. (1989)
  • Itoh Hitoshi ID: 9000258136347

    ULSI Research Laboratories, Toshiba Corporation, 1, Komukai Toshiba–cho, Saiwai–ku, Kawasaki 210, Japan (1997 from CiNii)

    Articles in CiNii:1

    • Low Dielectric Constant Insulator Formed by Downstream Plasma CVD at Room Temperature Using TMS/O2. (1997)
  • Itoh Hitoshi ID: 9000391842316

    Ebara Research Co. (2003 from CiNii)

    Articles in CiNii:1

    • Silica gel plate with bimodal pores for material with function both heat insulation and humidity control capacity (2003)
  • Itoh Hitoshi ID: 9000392706074

    Articles in CiNii:1

    • Tungsten Photochemical Vapor Deposition Mechanism in WF<SUB>6</SUB>+H<SUB>2</SUB> System II. Gas-Molecule Adspecies Collision Model (1986)
  • Itoh Hitoshi ID: 9000392706082

    Articles in CiNii:1

    • Tungsten Photochemical Vapor Deposition Mechanism in WF<SUB>6</SUB>+H<SUB>2</SUB> System I. Adspecies Excitation Model (1986)
  • Itoh Hitoshi ID: 9000392727671

    Articles in CiNii:1

    • Mechanism for Initial Stage of Selective Tungsten Growth Employing a WF<SUB>6</SUB> and SiH<SUB>4</SUB> Mixture (1991)
  • Itoh Hitoshi ID: 9000401566104

    Articles in CiNii:1

    • Chemical Vapor Deposition of Mn and Mn Oxide and their Step Coverage and Diffusion Barrier Properties on Patterned Interconnect Structures (2009)
  • Itoh Hitoshi ID: 9000401600015

    Articles in CiNii:1

    • Tungsten Photochemical Vapor Deposition Mechanism in WF6+H2System I. Adspecies Excitation Model (1986)
  • Itoh Hitoshi ID: 9000401600022

    Articles in CiNii:1

    • Tungsten Photochemical Vapor Deposition Mechanism in WF6+H2System II. Gas-Molecule Adspecies Collision Model (1986)
  • Itoh Hitoshi ID: 9000401622051

    Articles in CiNii:1

    • Mechanism for Initial Stage of Selective Tungsten Growth Employing a WF6and SiH4Mixture (1991)
  • Itoh Hitoshi ID: 9000401662661

    Articles in CiNii:1

    • Low Dielectric Constant Insulator Formed by Downstream Plasma CVD at Room Temperature UsingTMS/O2 (1997)
  • Itoh Hitoshi ID: 9000401685902

    Articles in CiNii:1

    • Effect of Underlayers on the Morphology and Orientation of Aluminum Films Prepared by Chemical Vapor Deposition Using Dimethylaluminumhydride (1999)
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