Search Results1-14 of  14

  • Jia Haijun ID: 9000381464674

    Articles in CiNii:1

    • High-density microwave plasma of SiH4/H-2 for high rate growth of highly crystallized microcrystalline silicon films (2006)
  • Haijun Jia ID: 9000305620909

    Institute of Nuclear and New Energy Technology, Tsinghua University (2011 from CiNii)

    Articles in CiNii:1

    • ICONE19-43746 DEFORMATION OF LONG SIMULATED FUEL ROD WITH ELECTRIC HEATING (2011)
  • JIA Haijun ID: 9000000271421

    Institute of Nuclear Energy Technology, Tsinghua University (2001 from CiNii)

    Articles in CiNii:2

    • Thermalhydraulic Investigation Using a Test Facility Simulating 200 MW Integral Heating Reactor (2000)
    • Review of Thermalhydraulic Experimental Researches at INET (2001)
  • JIA Haijun ID: 9000001097922

    Department of Functional Materials Science, Faculty of Engineering, Saitama University (2003 from CiNii)

    Articles in CiNii:1

    • Nanocrystalline Silicon Dots Fabricated by Pulse RF Plasma-Enhanced Chemical Vapor Deposition of SiCl4-and-H2 Mixture (2003)
  • JIA Haijun ID: 9000001161477

    Institute Nuclear Energy Technology, Tsinghua University (2004 from CiNii)

    Articles in CiNii:1

    • Gas Space and Flow Stability in Integrated Reactors (2004)
  • JIA Haijun ID: 9000001416154

    Department of Functional Materials Science, Faculty of Engineering, Saitama University (2004 from CiNii)

    Articles in CiNii:1

    • Effects of Chamber Wall Heating and Quartz Window on Fast Deposition of Microcrystalline Silicon Films by High-Density Microwave Plasma (2004)
  • JIA Haijun ID: 9000107376180

    Department of Functional Materials Science, Faculty of Engineering, Saitama University (2005 from CiNii)

    Articles in CiNii:1

    • Characterization of Microcrystalline Silicon Film Growth on ZnO:Al Using the High-Density Microwave Plasma (2005)
  • Jia Haijun ID: 9000024986927

    Articles in CiNii:1

    • Plasma Parameters for Fast Deposition of Highly Crystallized Microcrystalline Silicon Films Using High-Density Microwave Plasma (2006)
  • Jia Haijun ID: 9000258163757

    Department of Functional Materials Science, Faculty of Engineering, Saitama University (2003 from CiNii)

    Articles in CiNii:1

    • Nanocrystalline Silicon Dots Fabricated by Pulse RF Plasma-Enhanced Chemical Vapor Deposition of SiCl4-and-H2 Mixture (2003)
  • Jia Haijun ID: 9000258170898

    Department of Functional Materials Science, Faculty of Engineering, Saitama University (2004 from CiNii)

    Articles in CiNii:1

    • Effects of Chamber Wall Heating and Quartz Window on Fast Deposition of Microcrystalline Silicon Films by High-Density Microwave Plasma (2004)
  • Jia Haijun ID: 9000258178450

    Department of Functional Materials Science, Faculty of Engineering, Saitama University (2005 from CiNii)

    Articles in CiNii:1

    • Characterization of Microcrystalline Silicon Film Growth on ZnO:Al Using the High-Density Microwave Plasma (2005)
  • Jia Haijun ID: 9000401721756

    Articles in CiNii:1

    • Nanocrystalline Silicon Dots Fabricated by Pulse RF Plasma-Enhanced Chemical Vapor Deposition of SiCl4-and-H2Mixture (2003)
  • Jia Haijun ID: 9000401731254

    Articles in CiNii:1

    • Effects of Chamber Wall Heating and Quartz Window on Fast Deposition of Microcrystalline Silicon Films by High-Density Microwave Plasma (2004)
  • Jia Haijun ID: 9000401742397

    Articles in CiNii:1

    • Characterization of Microcrystalline Silicon Film Growth on ZnO:Al Using the High-Density Microwave Plasma (2005)
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